1. Catalyst-Free Metal-Organic Chemical Vapor Deposition Growth of InN Nanorods
- Author
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Min Hwa Kim, Kunook Chung, Euijoon Yoon, Dae Young Moon, Gyu-Chul Yi, Yasushi Nanishi, Miyoung Kim, Jong-Myeong Jeon, and Jinsub Park
- Subjects
Diffraction ,Materials science ,Hexagonal crystal system ,Biomedical Engineering ,Bioengineering ,General Chemistry ,Chemical vapor deposition ,Condensed Matter Physics ,Catalysis ,Metal ,Crystallography ,Electron diffraction ,visual_art ,visual_art.visual_art_medium ,General Materials Science ,Nanorod ,High-resolution transmission electron microscopy - Abstract
We demonstrated the successful growth of catalyst-free InN nanorods on (0001) Al2O3 substrates using metal-organic chemical vapor deposition. Morphological evolution was significantly affected by growth temperature. At 710 degrees C, complete InN nanorods with typical diameters of 150 nm and length of approximately 3.5 microm were grown with hexagonal facets. theta-2theta X-ray diffraction measurement shows that (0002) InN nanorods grown on (0001) Al2O3 substrates were vertically aligned along c-axis. In addition, high resolution transmission electron microscopy indicates the spacing of the (0001) lattice planes is 0.28 nm, which is very close to that of bulk InN. The electron diffraction patterns also revealed that the InN nanorods are single crystalline with a growth direction along (0001) with (10-10) facets.
- Published
- 2012
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