1. Hall effect study of the κ -(ET) 2X family: Evidence for Mott-Anderson localization
- Author
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Emil Tafra, Branimir Mihaljević, Yukihiro Yoshida, Martin Dressel, Takaaki Hiramatsu, Silvia Tomić, Gunzi Saito, Bojana Korin-Hamzić, Mario Basletić, Marko Kuveždić, Tomislav Ivek, Amir Hamzić, John A. Schlueter, and Matija Čulo
- Subjects
Anderson localization ,Materials science ,Condensed matter physics ,Mott insulator ,02 engineering and technology ,Crystal structure ,Electron ,021001 nanoscience & nanotechnology ,01 natural sciences ,Electrical resistivity and conductivity ,Hall effect ,0103 physical sciences ,010306 general physics ,0210 nano-technology ,Chemical composition ,Phase diagram - Abstract
We investigate the dc resistivity and Hall effect of the quasi-two-dimensional organic materials κ–(ET)2X, where X=Ag2(CN)3 and B(CN)4 and compare them with the results for X=Cu2(CN)3. All three compounds are considered to be quantum-spin-disordered Mott insulators. Despite high similarities in chemical composition and crystal structure, large differences in the dc resistivity and Hall coefficient are found. While around room temperature the dc transport properties are dominantly determined by the strength of the electron correlations, upon reducing the temperature, dc transport happens by hopping due to inherent disorder. The most disordered compound with X=Cu2(CN)3 turns out to have the lowest dc resistivity and the highest charge carrier density, i.e., in the phase diagram it is located closest to the metal-insulator transition. The least disordered compound with X=B(CN)4 shows the highest resistivity and the lowest carrier density, i.e., lies farthest from the metal-insulator transition. We explain such counterintuitive behavior within the theory of Mott-Anderson localization as a consequence of disorder-induced localized states within the correlation gap.
- Published
- 2019
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