Author: "Yuuki, Akimasa" / Publisher: american institute of physics - Searchworks@Jio Institute Digital Library Search Results

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Start Over Author "Yuuki, Akimasa" Publisher american institute of physics

Author: Furukawa, Taisuke, Yuuki, Akimasa, and Ono, Kouichi
Subjects: *ELECTRIC properties of thin films, *ANNEALING of crystals
Abstract: Investigates the electrical properties of thin silicon dioxide films for samples that suffered from Fowler-Nordheim (F-N) stress and annealing. Time-dependent dielectric breakdown lifetime for samples after annealing at temperatures greater than 400 degrees C; Reinjection of F-N currents; Anneal of neutral trapping sites created by F-N stresses.
Published: 1997
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