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The (Ba[sub 0.5]Sr[sub 0.5])TiO[sub 3] (BST) thin films were deposited on the LaNiO[sub 3]/Pt(111)/Ti/SiO[sub 2]/Si [LNO/ Pt(lll)] and LaNiO[sub 3]/Pt(200)/SiO[sub 2]/Si [LNO/Pt(200)] substrates by metalorganic deposition process. The BST films directly grown on the Pt(200) and Pt(lll) substrates exhibited random orientation. In case of the LNO/Pt(111) substrates, the BST film was also randomly oriented, but the insertion of LNO interlayer on the Pt(200) substrates caused the growth of (100) textured BST films. The dielectric constant of the 350-nm-thick BST films on LNO/Pt(200) was around 400, which was higher than that of the films on LNO/Pt(111) (around 340). This result was attributed to the fact that the polar axis of the (100) oriented film was more tilted away from the normal to the film surface than that of randomly oriented film. Also, the tunabilities of BST films deposited on the LNO/ Pt(200) and LNO/Pt(111) substrates were nearly 60% and 51% at the applied electric field of 400 kV/cm, respectively. Improved tunability has been attributed to the (100) texture of the film leading to an enhancement of the in-plane oriented polar axis. [ABSTRACT FROM AUTHOR]