1. Low-damage milling of an amino acid thin film with cluster ion beam
- Author
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Kazuya Ichiki, Yusaku Hontani, Takaaki Aoki, Toshio Seki, Jiro Matsuo, Satoshi Ninomiya, Masaki Hada, Yasuyuki Yamamoto, and Sachi Ibuki
- Subjects
Materials science ,Yield (engineering) ,Ion beam ,Analytical chemistry ,X-ray photoelectron spectra ,General Physics and Astronomy ,Fluence ,surface structure ,Ion ,ion beam applications ,ion beam effects ,X-ray photoelectron spectroscopy ,thin films ,Sputtering ,argon ,milling ,positive ions ,etching ,Irradiation ,Thin film ,organic compounds - Abstract
In this work, we characterized the surface damage layer and sputtering yield of polycrystalline L-leucine films before and after irradiation with Ar cluster or monomer ion beams with x ray photoelectron spectroscopy and ellipsometry. Irradiation with Ar monomer ion beams induced heavy damage on the surface of L-leucine films, such as bond breaking and carbonization. In contrast, no significant surface damage was observed in the films irradiated with Ar cluster ion beams. The sputtering yield of L-leucine decreased dramatically with increasing fluence of monomer Ar ions and approached the value of the sputtering yield of graphite; but under irradiation with Ar cluster ion beams, the sputtering yield remained constant with fluence. The differences in sputtering yield behavior were explained in relation with the surface damage layer on organic materials. Thus, cluster ion beams could potentially be used to mill down biological materials without significant damage on the surface and could contribute to various applications in the analysis and processing of life matter.
- Published
- 2011