1. Low frequency noise characteristics in multilayer WSe2 field effect transistor.
- Author
-
In-Tak Cho, Jong In Kim, Yoonki Hong, Jeongkyun Roh, Hyeonwoo Shin, Geun Woo Baek, Changhee Lee, Byung Hee Hong, Sung Hun Jin, and Jong-Ho Lee
- Subjects
TUNGSTEN compounds ,SELENIUM compounds ,FIELD-effect transistors ,SPECTRAL energy distribution ,TRANSITION metals - Abstract
This paper investigates the low-frequency noise properties of multilayer WSe
2 field effect transistors (FETs) in subthreshold, linear, and saturation regime. The measured noise power spectral density of drain current (SID ) shows that the low-frequency noise in multilayer WSe2 FET fits well to a 1/fγ power law with γ ~ 1 in the frequency range of 10Hz-200Hz. From the dependence of SID on the drain current, carrier mobility fluctuation is considered as a dominant low frequency noise mechanism from all operation regimes in multilayer WSe2 FET. Extracted Hooge's parameter in this study is within the value of 0.12, comparable to those of the transition metal dichalcogenide FETs in recent reports. [ABSTRACT FROM AUTHOR]- Published
- 2015
- Full Text
- View/download PDF