1. A demonstration of donor passivation through direct formation of V-As_i complexes in As-doped Ge_1−xSn_x
- Author
-
Anurag Vohra, Ilja Makkonen, Roger Loo, Geoffrey Pourtois, Afrina Khanam, Jonatan Slotte, Wilfried Vandervorst, Department of Applied Physics, KU Leuven, Antimatter and Nuclear Engineering, University of Helsinki, IMEC Vzw, University of Antwerp, Aalto-yliopisto, Aalto University, Department of Physics, Materials Physics, and Helsinki Institute of Physics
- Subjects
010302 applied physics ,Materials science ,Passivation ,Physics ,Doping ,Analytical chemistry ,General Physics and Astronomy ,chemistry.chemical_element ,Germanium ,02 engineering and technology ,Chemical vapor deposition ,DEFECTS ,Dopant Activation ,021001 nanoscience & nanotechnology ,Epitaxy ,01 natural sciences ,114 Physical sciences ,GERMANIUM ,Positron annihilation spectroscopy ,chemistry ,0103 physical sciences ,SI ,0210 nano-technology ,Saturation (magnetic) - Abstract
Positron annihilation spectroscopy in the Doppler and coincidence Doppler mode was applied on Ge 1 − xSn x epitaxial layers, grown by chemical vapor deposition with different total As concentrations ( ∼ 10 19– 10 21 cm − 3), high active As concentrations ( ∼ 10 19 cm − 3), and similar Sn concentrations (5.9%–6.4%). Positron traps are identified as mono-vacancy complexes. Vacancy-As complexes, V-As i, formed during the growth were studied to deepen the understanding of the electrical passivation of the Ge 1 − xSn x:As epilayers. Larger mono-vacancy complexes, V-As i ( i ≥ 2), are formed as the As doping increases. The total As concentration shows a significant impact on the saturation of the number of As atoms ( i = 4) around the vacancies in the sample epilayers. The presence of V-As i complexes decreases the dopant activation in the Ge 1 − xSn x:As epilayers. Furthermore, the presence of Sn failed to hinder the formation of larger V-As i complexes and thus failed to reduce the donor-deactivation.
- Published
- 2020