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Start Over Author "Weimin Si" Publisher american institute of physics, inc.
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1. Determination and reduction of ion-beam etching induced magnetic dead layer

Author

Weimin Si, Williams, Kurt, Campo, Mark, Ming Mao, Devasahayam, Adrian, and Chih-Ling Lee

Subjects
Magnetic recorders and recording -- Properties, Dielectric films -- Properties, Thin films -- Properties, Ion bombardment -- Analysis, Physics
Abstract

NiFe films with different thickness are etched under several Ar(super +)-ion-beam energy conditions. An optimal ion-beam etch process with a minimal magnetic dead layer thickness for the fabrication of advanced write poles in high-density magnetic recording heads is developed and recommended.

Published
2005

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