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In this study, we used reactive sputteringto prepare large-area,homogeneous gold oxide (AuOx) films, whichwe then subjected to reduction processes under ambient conditionsat room temperature to obtain reduced AuOxfilms featuring embedded Au nanoparticles (NPs). We analyzed thesefilms in terms of both their material characteristics and opticalproperties. For the first time, we obtained the optical constantsof AuOxfilms directly deposited on glassand Si substrates. Moreover, we observed localized surface plasmonresonance (LSPR) phenomena from the visible to the near-infrared (NIR)during the formation of the Au NPs in the AuOxfilm. The plasmonic properties of the Au NPs embedded in theAuOxfilms were much different from thoseof chemically synthesized Au NPs. We found that the LSPR wavelengthof the Au NPs embedded in the AuOxfilmscould be tuned from 700 to 980 nm by varying the duration of the reductionprocess. Moreover, the reduced AuOxfilmscould be applied as surface-enhanced Raman spectroscopy (SERS)-activesubstrates. The minimum detection was achieved down to a concentrationof 10–10M (R6G) when using the reduced AuOxfilm-based substrate–a level comparablewith those of other kinds of SERS substrates prepared using more complicatedmethods. The rapid method proposed herein provides large-areas filmswith tunable resonance wavelengths for applications as SERS-activesubstrates in optical and chemical sensing. [ABSTRACT FROM AUTHOR]

In this study, we combine graphene with gold oxide (AuOx), a transparent and high-work-function electrode material, to achieve a high-efficient, low-bias, large-area, flexible, transparent, broadband, and bifacial-operable photodetector. The photodetector operates through hot electrons being generated in the graphene and charge separation occurring at the AuOx-graphene heterojunction. The large-area graphene covering the AuOx electrode efficiently prevented reduction of its surface; it also acted as a square-centimeter-scale active area for light harvesting and photodetection. Our graphene/AuOx photodetector displays high responsivity under low-intensity light illumination, demonstrating picowatt sensitivity in the ultraviolet regime and nanowatt sensitivity in the infrared regime for optical telecommunication. In addition, this photodetector not only exhibited broadband (from UV to IR) high responsivity-3300 A W(-1) at 310 nm (UV), 58 A W(-1) at 500 nm (visible), and 9 A W(-1) at 1550 nm (IR)-but also required only a low applied bias (0.1 V). The hot-carrier-assisted photoresponse was excellent, especially in the short-wavelength regime. In addition, the graphene/AuOx photodetector exhibited great flexibility and stability. Moreover, such vertical heterojunction-based graphene/AuOx photodetectors should be compatible with other transparent optoelectronic devices, suggesting applications in flexible and wearable optoelectronic technologies.

In this study, we demonstrated that the improvement of detection capability of cadmium sulfide (CdS) photoconductors in the ultraviolet (UV) regime is much larger than that in the visible regime, suggesting that the deep UV laser-treated CdS devices are very suitable for low-light detection in the UV regime. We determined that a nanocrystallized CdS photoconductor can behave as a picowatt-sensitive detector in the UV regime after ultra-shallow-region crystallization of the CdS film upon a single shot from a KrF laser. Photoluminescence and Raman spectra revealed that laser treatment increased the degree of crystallization of the CdS and led to the effective removal of defects in the region of a few tens nanometers beneath the surface of CdS, confirming the result by the transmission electron microscopy (TEM) images. Optical simulations suggested that UV light was almost completely absorbed in the shallow region beneath the surface of the CdS films, consistent with the observed region that underwent major crystal structure transformation. Accordingly, we noted a dramatic enhancement in responsivity of the CdS devices in the UV regime. Under a low bias voltage (1 mV), the treated CdS device provided a high responsivity of 74.7 A W(-1) and a detectivity of 1.0×10(14) Jones under illumination with a power density of 1.9 nW cm(-2). Even when the power of the UV irradiation on the device was only 3.5 pW, the device exhibited extremely high responsivity (7.3×10(5) A W(-1)) and detectivity (3.5×10(16) Jones) under a bias voltage of 1 V. Therefore, the strategy proposed in this study appears to have great potential for application in the development of CdS photoconductors for picowatt-level detection of UV light with low power consumption.

We demonstrate an inspection technique, based on only one ellipsometric parameter, Ψ, of spectroscopic ellipsometry (SE), for the rapid, simultaneous identification of both the structural quality and thicknesses of large-area graphene films. The measured Ψ spectra are strongly affected by changes in the out-of-plane absorption coefficients (αTM); they are also correlated to the ratio of the intensities of the D and G bands in Raman spectra of graphene films. In addition, the electronic transition state of graphene within the UV regime assists the characterization of the structural quality. We also demonstrated that the intensities and shifts of the signals in Ψ spectra allow clear identification of the structural qualities and thicknesses, respectively, of graphene films. Moreover, this Ψ-based method can be further applied to graphene films coated on various substrates. In addition, mapping of the values of Ψ is a very convenient and useful means of rapidly characterizing both the structural quality and thickness of 2D materials at local areas. Therefore, this Ψ-based characterization method has great potential for application in the mass production of devices based on large-area graphene.

In this study, we find that the optical anisotropy of graphene films could be used as an alternative quality factor for the rapid characterization of large-area graphene films prepared through chemical vapor deposition. We develop an angle-variable spectroscopic method to rapidly determine the optical anisotropy of graphene films. Unlike approaches using Raman scattering spectroscopy, this optical anisotropy method allows ready characterization of the structural quality of large-area graphene samples without the application of high-intensity laser irradiation or complicated optical setups. Measurements of optical anisotropy also allow us to distinguish graphene samples with different extents of structural imperfections; the results are consistent with those obtained from using Raman scattering spectroscopy. In addition, we also study the properties of graphene-based transparent conductive films at wide incident angles because of the advantage of the optical anisotropic properties of graphene. The transmittance of graphene is much higher than that of indium tin oxide films, especially at large incident angles.