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Semiconducting single-walled carbon nanotube (s-CNT) arrays are being explored for next-generation semiconductor electronics. Even with the multitude of alignment and spatially localized s-CNT deposition methods designed to control s-CNT deposition, fundamental understanding of the driving forces for s-CNT deposition is still lacking. The individual roles of the dispersant, solvent, target substrate composition, and the s-CNT itself are not completely understood because it is difficult to decouple deposition parameters. Here, we study poly[(9,9-dioctylfluorenyl-2,7-diyl)- alt - co -(6,6'-[2,2'-{bipyridine}])] (PFO-BPy)-wrapped s-CNT deposition from solution onto a chemically modified substrate. We fabricate various self-assembled monolayers (SAMs) to gain a greater understanding of substrate effects on PFO-BPy-wrapped s-CNT deposition. We observe that s-CNT deposition is dependent on both the target substrate and s-CNT dispersion solvent. To complement the experiments, molecular dynamics simulations of PFO-BPy-wrapped s-CNT deposition on two different SAMs are performed to obtain mechanistic insights into the effect of the substrate and solvent on s-CNT deposition. We find that the global free-energy minimum associated with favorable s-CNT adsorption occurs for a configuration in which the minimum of the solvent density around the s-CNT coincides with the minimum of the solvent density above a SAM-grafted surface, indicating that solvent structure near a SAM-grafted surface determines the adsorption free-energy landscape driving s-CNT deposition. Our results will help guide informative substrate design for s-CNT array fabrication in semiconductor devices.

High grafting density polymer brushes are grown on an inimer coating bearing nitroxide-mediated polymerization (NMP) inimers and glycidyl methacrylate (GMA). The inimer coating is cross-linked on the substrate to provide an initiator layer with needed stability during long exposure to organic solvents at moderate to high temperatures. Surface-initiated nitroxide-mediated polymerization (SI-NMP) is conducted to grow polystyrene (PS) brushes on the coating with a sacrificial layer designed to cleave the brushes. The cleaved brushes have larger molecular weights than the corresponding free polymers. The grafting density of the brushes is as high as 1.12 chains/nm 2 throughout the brush growth, which is among the densest PS brushes reported so far. Atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS) depth profiling are used to reveal the surface morphology and kinetics of the growth.