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Time resolved photoluminescence and deep level transient spectroscopy have been used to monitor the effect of rapid thermal annealing on bulk GaInP and GaInP/AlGaInP quantum wells grown by solid source molecular beam epitaxy similar to those used in 650 nm range lasers. Following rapid thermal annealing at temperatures up to 875 °C, reductions in the concentration of several deep level traps are observed. Correlation of these data with photoluminescent intensity and lifetime measurements indicate that the defect labeled N3, 0.83 eV below the conduction band, is the dominant recombination center. The combination of these two transient spectroscopy measurement techniques is therefore not only able to measure the change in deep level concentration, but also to correlate this change with improved carrier lifetimes and, ultimately, reduced threshold current densities in quantum well lasers. There is also evidence to suggest that this same defect, possibly a phosphorous vacancy or a related complex, plays an im...

We have examined the influence of rapid thermal annealing on the performance characteristics of GaInP/AlGaInP quantum well lasers which were grown by all-solid-source molecular beam epitaxy. It was found that when the laser structures were annealed the threshold current densities of the lasers decreased significantly. This improvement in lasing performance could be associated with the possibility that annealing removed nonradiative recombination centers from the quantum wells. The emission wavelength, differential quantum efficiency, and characteristic temperature were not affected to any remarkable extent, indicating that the interdiffusion of group-III elements did not damage the structures.

We report on the growth of 980‐nm strained‐layer InGaAs/GaInAsP/GaInP separated confinement quantum well lasers using all solid source molecular beam epitaxy. Valved cracker cells were employed for both phosphorus and arsenic. Fabricated lasers exhibited excellent performance that is comparable to similar lasers grown by gas source molecular beam epitaxy in our laboratory. A maximum output power of 450 mW and over 250 mW in single mode operation was achieved for ridge waveguide lasers with AR/HR coated facets.

Unipolar electron impact ionization and multiplication in photodiodes consisting of GaAs/AlGaAs multiquantum well heterostructures have been observed. In these diodes, electrons generated by photon absorption and accelerated in the barrier regions scatter bound electrons from the donor‐doped GaAs wells. Gain‐per‐well of 1.13±0.05 and total gain of 100 for the multiplication region have been demonstrated. The photodiodes exhibit high dark current which arises from thermionic emission and tunneling of electrons out of the wells.