1. Joule heat-induced breakdown of organic thin-film devices under pulse operation
- Author
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Toshinori Matsushima, Yu Shiihara, Jun Mizuno, Kou Yoshida, Chihaya Adachi, and Hiroyuki Kuwae
- Subjects
010302 applied physics ,Work (thermodynamics) ,Materials science ,business.industry ,Relaxation (NMR) ,General Physics and Astronomy ,02 engineering and technology ,Substrate (electronics) ,Heat sink ,021001 nanoscience & nanotechnology ,01 natural sciences ,0103 physical sciences ,Thermal ,Sapphire ,Optoelectronics ,Thin film ,0210 nano-technology ,business ,Joule heating - Abstract
We investigated the influence of the substrate's thermal conductivities (k) and the widths of the electrical pulses (τpulse) on the maximum current densities (Jmax) in organic thin-film devices. We also estimated the temperature rise (ΔT) inside devices under the pulse operation using numerical calculations to interpret the observed differences in Jmax. For a long τpulse of 5 μs, Jmax is higher for devices with high-k sapphire substrates (around 1.2 kA/cm2) than devices with low-k plastic substrates (around 0.4 kA/cm2). This is because high-k sapphire substrates can work as heat sinks to relax ΔT for such a long τpulse. Operation of devices with high-k sapphire substrates for a short τpulse of 70 ns resulted in further relaxation of ΔT, leading to an increase of Jmax to around 5 kA/cm2. Interestingly, for such a short τpulse, devices with high-k sapphire and low-k plastic substrates showed similar Jmax and ΔT values, the reason for which may be that it is difficult for the generated Joule heat to travel to the substrate across a low-k organic layer within this short time.We investigated the influence of the substrate's thermal conductivities (k) and the widths of the electrical pulses (τpulse) on the maximum current densities (Jmax) in organic thin-film devices. We also estimated the temperature rise (ΔT) inside devices under the pulse operation using numerical calculations to interpret the observed differences in Jmax. For a long τpulse of 5 μs, Jmax is higher for devices with high-k sapphire substrates (around 1.2 kA/cm2) than devices with low-k plastic substrates (around 0.4 kA/cm2). This is because high-k sapphire substrates can work as heat sinks to relax ΔT for such a long τpulse. Operation of devices with high-k sapphire substrates for a short τpulse of 70 ns resulted in further relaxation of ΔT, leading to an increase of Jmax to around 5 kA/cm2. Interestingly, for such a short τpulse, devices with high-k sapphire and low-k plastic substrates showed similar Jmax and ΔT values, the reason for which may be that it is difficult for the generated Joule heat to travel t...
- Published
- 2017
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