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The nonradiative lifetime (τNR) of the near-band-edge emission in various quality GaN samples is compared with the results of positron annihilation measurement, in order to identify the origin and to determine the capture-cross-section of the major intrinsic nonradiative recombination centers (NRCs). The room-temperature τNR of various n-type GaN samples increased with decreasing the concentration of divacancies composed of a Ga vacancy (VGa) and a N vacancy (VN), namely, VGaVN. The τNR value also increased with increasing the diffusion length of positrons, which is almost proportional to the inverse third root of the gross concentration of all point defects. The results indicate that major intrinsic NRC in n-type GaN is VGaVN. From the relationship between its concentration and τNR, its hole capture-cross-section is estimated to be about 7 × 10−14 cm2. Different from the case of 4H-SiC, the major NRCs in p-type and n-type GaN are different: the major NRCs in Mg-doped p-type GaN epilayers are assigned to ...

For rating unambiguous performance of a light-emitting semiconductor material, determination of the absolute quantum efficiency (AQE) of radiation, which is basically a product of internal quantum efficiency (IQE) and light-extraction efficiency, is the most delightful way. Here, we propose the use of omnidirectional photoluminescence (ODPL) spectroscopy for quantifying AQE of the near-band-edge (NBE) emission, in order to evaluate bulk GaN crystals and wafers. When the measurement was carried out in the air, the AQE showed a continuous decrease most likely due to the formation of extrinsic nonradiative recombination channels at the surface by photo-pumping. However, such an influence was suppressed by measuring ODPL in an inert ambient such as nitrogen or in vacuum. Consequently, AQE was revealed to depend on the photo-pumping density. The increase in AQE of the NBE emission caused by the increase in the excess carrier concentration was significant, indicating gradual saturation of nonradiative recombina...

Omnidirectional photoluminescence (ODPL) measurement using an integrating sphere was carried out to absolutely quantify the quantum efficiency of radiation ( η) in high quality GaN single crystals. The total numbers of photons belonging to photoluminescence (PL photons) and photons belonging to an excitation source (excitation photons) were simultaneously counted in the measurement, and η was defined as a ratio of the number of PL photons to the number of absorbed excitation photons. The ODPL spectra near the band edge commonly showed a two-peak structure, which originates from the sharp absorption edge of GaN. A methodology for quantifying internal quantum efficiency ( ηint) from such experimentally obtained η is derived. A record high ηint of typically 15% is obtained for a freestanding GaN crystal grown by hydride vapor phase epitaxy on a GaN seed crystal synthesized by the ammonothermal method using an acidic mineralizer, when the excitation photon energy and power density were 3.81 eV and 60 W/cm2, r...

Structural and optical qualities of half-a-μm-thick m-plane Al1−xInxN epilayers grown by metalorganic vapor phase epitaxy were remarkably improved via coherent growth on a low defect density m-plane freestanding GaN substrate prepared by hydride vapor phase epitaxy. All the epilayers unexceptionally suffer from uniaxial or biaxial anisotropic in-plane stress. However, full-width at half-maximum values of the x-ray ω-rocking curves were nearly unchanged as the underlayer values being 80 ∼ 150 arc sec for ( 101¯0) and ( 101¯2) diffractions with both ⟨0001⟩ and ⟨112¯0⟩ azimuths, as long as pseudomorphic structure was maintained. Such Al1−xInxN epilayers commonly exhibited a broad but predominant luminescence peak in ultraviolet (x ≤ 0.14) to green (x = 0.30) wavelengths. Its equivalent value of the internal quantum efficiency at room temperature was as high as 67% for x = 0.14 and 44% for x = 0.30. Because its high-energy cutoff commonly converged with the bandgap energy, the emission peak is assigned to ori...

Local carrier dynamics around the sub-surface basal-plane stacking faults (BSFs) accidentally formed in a low dislocation density c-plane GaN were studied by the spatio-time-resolved cathodoluminescence measurement. A high photoelectron (PE) emission efficiency of the front-excitation-type PE-gun enabled to investigate sub-surface defect structures with low acceleration voltages. As a result, the presence of an energy transfer channel of excitons from neutral donor bound states to I1-type BSF bound states was confirmed. Careful comparisons of cathodoluminescence intensity mapping images taken at 3.305 eV and those corresponding to I1-BSFs indicated the presence of prismatic-plane stacking faults connecting the BSFs into a bundle.