1. Influence of alpha particle bombardment and postannealing on photoluminescence from GaAs/Al0.35Ga0.65As multiple quantum wells
- Author
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Jurgis Kundrotas, Steponas Ašmontas, C. Leroy, Klaus Köhler, Gintaras Valušis, Adolfas Dargys, and Publica
- Subjects
Photoluminescence ,Materials science ,business.industry ,Annealing (metallurgy) ,quantum well ,General Physics and Astronomy ,Alpha particle ,III-V semiconductor ,Molecular physics ,Fluence ,Crystallographic defect ,Zyklotronenresonanz ,Impurity ,Photolumineszenz ,Optoelectronics ,photoluminescence ,III-V Halbleiter ,Quantenfilm ,Irradiation ,cyclotron resonance ,business ,Molecular beam epitaxy - Abstract
Multiple quantum well (MQW) samples grown by the molecular beam epitaxy method were irradiated by alpha particles from isotope 239.Pu. The photoluminescence (PL) spectra and PL integrated intensity dependencies are presented at various alpha particle fluences, up to 10(exp 11) cm(exp -2). The experimental results are in agreement with a model which assumes that point centers (residual impurities and point defects introduced during irradiation) are responsible for PL intensity decrease with the alpha particle fluence. It was found that annealing of irradiated MQW samples at a temperature above 650 K nearly restores the PL intensity. An enhancement of PL by more than an order of magnitude was observed at annealing temperatures higher than 850 K, just before GaAs and Al(0.35)Ga(0.65)As interdiffusion begins.
- Published
- 2001