1. Laser induced reactions of metal films with silicon
- Author
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J. M. Poate, Harry J. Leamy, George K. Celler, and T. T. Sheng
- Subjects
Materials science ,Silicon ,Metallurgy ,Analytical chemistry ,chemistry.chemical_element ,Laser ,Microstructure ,Q-switching ,law.invention ,chemistry ,law ,Molybdenum ,Laser power scaling ,Single crystal ,Layer (electronics) - Abstract
Thin Pt, Pd and Ni films have been reacted with single crystal Si, using Q‐switched Nd:YAG laser pulses of 100 nsec duration in the power range 18–50 MW cm−2, to produce layers that are laterally very uniform in thickness but are not single phase. Average composition and thickness of the reaction product layer can be changed over a wide range by varying starting film thickness and laser power. The microstructure of the reacted layers indicates that reaction occurs via surface melting, mixing and rapid resolidification. Molybdenum and Nb films have been reacted with Si at powers of approximately 90 WM cm−2.
- Published
- 1979
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