1. Characteristic of Zn[sub x]Cd[sub 1−x]O alloy film grown by RF magnetron co-sputtering system
- Author
-
J. H. Yu, J. H. Kim, T. S. Jeong, C. J. Youn, Jisoon Ihm, and Hyeonsik Cheong
- Subjects
Materials science ,Band gap ,business.industry ,Alloy ,Oxide ,Substrate (electronics) ,engineering.material ,Crystallinity ,chemistry.chemical_compound ,Crystallography ,chemistry ,Sputtering ,Cavity magnetron ,X-ray crystallography ,engineering ,Optoelectronics ,business - Abstract
ZnO based oxide system ZnxCd1−xO alloy of various compositions has been successfully grown by the RF co‐sputtering system. ZnxCd1−xO alloy films, which have x = 0, 0.01, 0.02, 0.05, 0.08, 0.13 and 1, were grown on Al2O3 substrate. From the XRD measurement, the ZnxCd1−xO films observed to be hexagonal structure at the range of 0≤x≤0.08. At x = 0.13, the mixed crystalline of the hexagonal‐cubic structure was measured. Also, the optical bandgap energy has been modulated from 3.3 eV to 2.4 eV. After post‐Annealing, the crystallinity of the ZnxCd1−xO films improved. Furthermore, this process suggests that it is very important to maintain the optical performance for LED and LD devices.
- Published
- 2011
- Full Text
- View/download PDF