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Start Over Author "Pease, R.F.W." Publication Year Range More than 50 years ago
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3. Applications of the electron beam exposure system (EBES).

Author

Pease, R.F.W., Ballantyne, J.P., Henderson, R.C., Voshchenkov, A.M., and Yau, L.D.

Abstract

We review the following applications of electron lithography: (1) making high quality chrome masks for photolithography (2) making, by direct exposure, MOS integrated circuits with finer dimensions than normally obtained with photolithography, to achieve higher packing density and improved electrical performance. [ABSTRACT FROM PUBLISHER]

Published
1974
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