1. One-step synthesis of graphene containing topological defects
- Author
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Klein, Benedikt P., Stoodley, Matthew A., Deyerling, Joel, Rochford, Luke A., Morgan, Dylan B., Hopkinson, David, Sullivan-Allsop, Sam, Eratam, Fulden, Sattler, Lars, Weber, Sebastian M., Hilt, Gerhard, Generalov, Alexander, Preobrajenski, Alexei, Liddy, Thomas, Williams, Leon B. S., Lee, Tien-Lin, Saywell, Alex, Gorbachev, Roman, Haigh, Sarah J., Allen, Christopher, Auwärter, Willi, Maurer, Reinhard J., and Duncan, David A.
- Subjects
Condensed Matter - Materials Science ,Condensed Matter - Mesoscale and Nanoscale Physics - Abstract
Chemical vapour deposition enables large-domain growth of ideal graphene, yet many applications of graphene require the controlled inclusion of specific defects. We present a one-step chemical vapour deposition procedure aimed at retaining the precursor topology when incorporated into the grown carbonaceous film. When azupyrene, the molecular analogue of the Stone-Wales defect in graphene, is used as a precursor, carbonaceous monolayers with a range of morphologies are produced as a function of the copper substrate growth temperature. The higher the substrate temperature during deposition, the closer the resulting monolayer is to ideal graphene. Analysis, with a set of complementary materials characterisation techniques, reveals morphological changes closely correlated with changes in the atomic adsorption heights, network topology, and concentration of 5-/7-membered carbon rings. The engineered defective carbon monolayers can be transferred to different substrates, potentially enabling applications in nanoelectronics, sensorics, and catalysis., Comment: manuscript and SI provided
- Published
- 2024