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The sputtering of UF4 targets by energetic beams of O-16, F-19, and Cl-35 ions has been investigated for beam energies in the range 0.12 to 1.5 MeV/amu. The sputtering yields, which follow the same trend as the electronic part of the projectile energy loss in the material, are observed to have a strong dependence on the charge state of the incident ions. Data have been taken both in transmission and reflection (0 and 180 deg to the incident beam direction, respectively). Energy spectra of the neutral sputtered particles have been obtained for 5 MeV F-19 ions and for 13 MeV Cl-35 ions; in both cases the spectrum has a Maxwellian form. The data obtained are compared with several models of the high energy sputtering process.

In this paper recent experimental results on sputtering of UF4 and H2O (ice) by fast heavy ions are reviewed. Measurements have been made of the dependence of the sputtering yield on the incident ion type, charge state, and energy. In the case of UF4, the energy spectra of neutral sputtered particles have been obtained as well. There is a clear dependence of the sputtering yield on the electronic part of the stopping power, and the yield is strongly affected by the charge state of the incident ion, which shows that in the near-surface region from which sputtered particles arise, the charge state of the incident ion has not reached equilibrium. The shape of the energy spectra observed for UF4 targets is that expected from a thermal distribution rather than that of the collision cascade form typical of ordinary sputtering. A model of the sputtering-track registration process that has arisen from these data is shown to provide a framework of understanding the close relationship of these observations to the 'plasma desorption' of marcromolecules.