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Purpose: Wafer bonding is a key process for 3 D advanced packaging of integrated circuits. It requires very high accuracy for the wafer alignment. To solve the problems of large movement stroke, position calibration error and low production efficiency in optical alignment, this paper aims to propose a new wafer magnetic alignment technology (MAT) which is based on tunnel magneto resistance effect. MAT can realize micro distance alignment and reduces the design and manufacturing difficulty of wafer bonding equipment. Design/methodology/approach: The current methods and existing problems of wafer optical alignment are introduced, and the mechanism and realization process of wafer magnetic alignment are proposed. Micro magnetic column (MMC) marks are designed on the wafer by the semiconductor manufacturing process. The mathematical model of the space magnetic field of the MMC is established, and the magnetic field distribution of the MMC alignment is numerically simulated and visualized. The relationship between the alignment accuracy and the MMC diameter, MMC remanence, MMC thickness and sensor measurement height was studied. Findings: The simulation analysis shows that the overlapping double MMCs can align the wafer with accuracy within 1 µm and can control the bonding distance within the micrometer range to improve the alignment efficiency. Originality/value: Magnetic alignment technology provides a new idea for wafer bonding alignment, which is expected to improve the accuracy and efficiency of wafer bonding. [ABSTRACT FROM AUTHOR]

In this letter, we present a photoreceiver front-end circuit that consists of an InP p-i-n photodetector (PIN PD) on an InP transimpedance amplifier (TIA) with double HBTs (DHBTs), in which the key integrated fabrication route of a transfer-printing (TP) process is introduced. Prior to integration, PDs and TIAs are individually fabricated on their respective wafers. Then, a discrete PD with only active layers is transferred onto the destination on a TIA wafer, thereafter, an on-chip coplanar waveguide connection is integrated. The PIN PD and DHBT TIA exhibit excellent performance, characterized by a responsivity of 0.51 A/W at $1.55~\mu \text{m}$ with a bandwidth of 20 GHz and a transimpedance gain of 36 dB $\Omega $ with a bandwidth of 27 GHz, respectively. Finally, the monolithically integrated circuit demonstrates a better frequency response by maximally reducing the parasitic effect, with an open clear eye diagram under a 20 Gb/s nonreturn-to-zero pattern, which evidently manifests its ability for ultrahigh-rate data operation. The present work, by employing a TP process, overcomes the issues in integrating discrete optoelectronic devices and proposes a unique approach for monolithic optoelectronic integrated circuit fabrication. [ABSTRACT FROM AUTHOR]

Wafer-scale heterogeneous integration provides a viable pathway for the development of highly capable microsystems. However, it remains challenging to integrate die-and wafer-level components with a high-density interconnects while minimizing the system volume and within the temperature restrictions imposed by integrated circuits. Advancements in CMOS have motivated the development of low-temperature and low-resistance metal–silicon alloys or silicides. Nickel silicide (NiSi) is a CMOS-compatible material that forms at temperatures and anneal times within the thermal budget of commercial CMOS die and can be implemented with a wide range of nickel and silicon thin-film processing methods. We describe here the development of a 3-D integration strategy utilizing NiSi formation to generate both mechanical bonding and electrical interconnection between wafers. Specifically, we show that our NiSi-based wafer-bonding process is effective below 400 °C, at very short anneal times (minutes), and with a variety of thin-film processing methods. This NiSi-based process offers a robust approach for creating heterogeneously integrated microsystems in a CMOS-compatible fashion. [ABSTRACT FROM AUTHOR]

A new concept of semiconductor wafer bonding, mediated by optical wavelength conversion materials, is proposed and demonstrated. The fabrication scheme provides simultaneous bond formation and interfacial function generation, leading to efficient device production. Wavelength-converting functionalized semiconductor interfacial engineering is realized by utilizing an adhesive viscous organic matrix with embedded fluorescent particles. The bonding is carried out in ambient air at room temperature and therefore provides a cost advantage with regard to device manufacturing. Distinct wavelength conversion, from ultraviolet into visible, and high mechanical stabilities and electrical conductivities in the bonded interfaces are verified, demonstrating their versatility for practical applications. This bonding and interfacial scheme can improve the performance and structural flexibility of optoelectronic devices, such as solar cells, by allowing the spectral light incidence suitable for each photovoltaic material, and photonic integrated circuits, by delivering the respective preferred frequencies to the optical amplifier, modulator, waveguide, and detector materials. [ABSTRACT FROM AUTHOR]