Search

In this paper, we present a novel method for growing carbon nanotubes (CNTs) via microwave plasma chemical vapor deposition (MPCVD) on diamond and silicon substrates. Scanning electron microscopy (SEM) and Raman spectroscopy analyses revealed dense, multi-walled carbon nanotubes growing on the diamond substrate. Optical Emission Spectroscopy (OES) showed that in the process of growing carbon nanotubes with the MPCVD method, the CH4 introduced into the system is excited by microwaves and dissociated to form active radicals such as C2 and CH, which are considered the C source of the synthesized carbon nanotube. Observation with high-resolution transmission electron microscopy (HRTEM) showed that most Ni catalyst nanoparticles that catalyze the growth of carbon nanotubes are located close to the diamond surface. In contrast, on the Si substrate, Ni catalyst nanoparticles were randomly distributed. A unique transition layer was observed between the diamond and carbon nanotubes, with the Ni particles being immersed into this transition layer and acting as anchors to fix the carbon nanotubes, resulting in a robust connection between the diamond and the CNT coating. [ABSTRACT FROM AUTHOR]

In the present investigation, a nitrogen-doped multilayer homoepitaxial single crystal diamond is synthesized on a high-pressure high temperature (HPHT) Ib-type diamond substrate using the microwave plasma chemical vapor deposition (MPCVD) method. When 0.15 sccm of nitrogen was added in the gas phase, the growth rate of the doped layer was about 1.7 times that of the buffer layer, and large conical and pyramidal features are formed on the surface of the sample. Raman mapping and photoluminescence imaging of the polished cross sectional slice shows a broadband emission, with a characteristic zero phonon line (ZPL) at 575 nm in the doped layers, and large compressive stress was formed in the nitrogen-doped layers. X-ray topography shows that the defects at the interface can induce dislocation. The pyramid feature is formed at the defect, and more nitrogen-related defects are formed in the pyramid region. Thin nitrogen-doped multilayers were successfully prepared, and the thickness of the nitrogen-doped and buffer layers was about 650 nm each. The indentation measurements reveal that the thin nitrogen-doped multilayers are ultra-tough (at least ~22 MPa m1/2), compared to the Ib-type HPHT seed substrate (~8 MPa m1/2) and the unintentionally doped chemical vapor deposition (CVD) single crystal diamond (~14 MPa m1/2). [ABSTRACT FROM AUTHOR]