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Photoacid-catalyzed sol-gel polymerization is now recognized as a powerful single-step synthetic approach to the synthesis of hybrid films, which can be distinguished from conventional sol-gel methods by higher reactivity and a solvent-free process. Despite its utility, the mechanism is not yet understood, in particular what chemical, physical, and photochemical parameters determine the precise sequence, kinetics, and advancement of this UV inorganic photopolymerization. Here, using mainly transmission real-time Fourier transformed infrared (RT-FTIR) spectroscopy, we characterize in situ the hydrolysis-condensation reactions of oligomeric silicon alkoxides and the formation of byproducts. Systematic review and assessment of numerous processing variables (relative humidity, film thickness, precursor structure, nature, and the concentration of photoacid generator) prove that the reaction kinetics are controlled by the two independent phenomena: the intrinsic chemical reaction rates and the water vapor permeation into the film.

Water intrusion-extrusion isotherms performed at room temperature on hydrophobic pure silica chabazite show that the water-Si-CHA system displays real spring behavior. However, differences in pressure-volume diagrams are observed between the first and the other intrusion-extrusion cycles, indicating that some water molecules interact with the inorganic framework after the first intrusion. (29)Si and especially (1)H solid-state NMR showed the creation of new defect sites upon the intrusion-extrusion of water and the existence of two kinds of water molecules trapped in the supercage of Si-CHA: a first layer of water strongly hydrogen bonded with the silanols of the framework and a subsequent layer of liquidlike physisorbed water molecules undergoing interaction with the first layer. This hydrogen bonding scheme is also supported by X-ray powder diffraction.