1. Steric hindrance effect induced photopurification of styrene oxide over surface modified polymeric carbon nitride.
- Author
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Liu, Meixian, Liu, Junliang, Zeng, Zequan, Wang, Xing, Jia, Jianfeng, Gu, Xianmo, and Zheng, Zhanfeng
- Subjects
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STERIC hindrance , *STYRENE oxide , *NITRIDES , *CYANO group , *INDUSTRIAL goods , *CARBON - Abstract
[Display omitted] • N V guarentee the evolution of O 2 to H 2 O 2 as O 2 exclusive adsorption sites, which improves the efficiency of photopurification work. • –CN, substitutes for hydrogens in primary amines, offer the opportunity for controlling reaction selectivity by inhibiting H 2 O 2 randomly decomposing to •OH. • The steric hindrance effect between N3C and SO induced by –CN and N V prevents H 2 O 2 reducing to •OH enabling the stable presence of SO. The key of photopurification, a bran-new technique for substance purification, is selective mineralization by surface modification of photocatalyst. CN/N V -PCN, nitrogen vacancies (N V) and cyano groups (–CN) co-modified polymeric carbon nitride (PCN), selectively photomineralize benzaldehyde (BZ) in industrial styrene oxide (SO) production solution. N V , special O 2 adsorption sites, guarantee the activation of O 2 to H 2 O 2. –CN, substitutes for hydrogens in terminal amines (–NH 2), inhibit H 2 O 2 randomly decomposing to •OH on –NH 2 sites. N V and –CN adjust the electronic distribution on triazine ring and H to reinforce π-π interaction and O···H N bond between PCN and SO, narrowing the space between benzene ring and N3C site, in which the steric hindrance effect hinders H 2 O 2 reducing to •OH by e- on N3C site. •OH can only produce at the adsorption sites of BZ, which results the selective mineralization of BZ. This work provides not only a modification method of PCN for selective oxidation reaction, but also a bran-new technique for removing homogeneous trace impurities in natural or industrial products. [ABSTRACT FROM AUTHOR]
- Published
- 2022
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