1. Effect of Lateral Charge Diffusion on Retention Characteristics of 3D NAND Flash Cells
- Author
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Jong-Ho Lee, Eunmee Kwon, Bongsik Choi, Byung-Gook Park, Jong-Ho Bae, S.-C. Chung, Honam Yoo, Ho-Jung Kang, and Jong-Won Back
- Subjects
Physics ,Linear relationship ,Degree (graph theory) ,Diffusion ,Lateral diffusion ,Analytical chemistry ,Charge (physics) ,Electrical and Electronic Engineering ,Electronic, Optical and Magnetic Materials - Abstract
Retention characteristics of 3D NAND Flash cells are investigated at various temperatures ( ${T}$ ) depending on the degree of program and erase. The $\Delta {V}_{\text {th}}$ for each condition is compared to understand the degradation of the retention characteristics attributable to vertical loss and/or lateral diffusion. In addition, the relationship between Program/Erase (PE) window (PGM ${V}_{\text {th}}$ – Erase ${V}_{\text {th}}$ ) and $\Delta {V}_{\text {th}}$ are analyzed. In the case when PGM ${V}_{\text {th}}$ is the same, the $\Delta {V}_{\text {th}}$ decreases as the PE window decreases. At temperatures below 150 °C, $\Delta {V}_{\text {th}}$ and PE window show linear relationship, and as PE window decreases, $\Delta {V}_{\text {th}}$ also decreases to 0. On the other hand, at 250 °C, $\Delta {V}_{\text {th}}$ has a non-zero value even if PE window decreases to 0, thus has a non-linear relationship. The measurement results show that the lateral diffusion has a great influence on the short-term retention of 3D NAND flash cells.
- Published
- 2021
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