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7. Performance of differential pair circuits designed with line tunnel FET devices at different temperatures.

10. The impact of the temperature on In0.53Ga0.47As nTFETs

11. Record performance Top-down In0.53Ga0.47As vertical nanowire FETs and vertical nanosheets

15. First demonstration of ∼3500 cm2/V-s electron mobility and sufficient BTI reliability (max Vov up to 0.6V) In0.53Ga0.47As nFET using an IL/LaSiOx/HfO2 gate stack

18. A New Direction for III–V FETs for Mobile CPU Operation Including Burst-Mode: In0.35Ga0.65As Channel

20. The Smaller the Noisier? Low Frequency Noise Diagnostics of Advanced Semiconductor Devices

23. Top-down InGaAs nanowire and fin vertical FETs with record performance

24. Record mobility (μeff ∼3100 cm2/V-s) and reliability performance (Vov∼0.5V for 10yr operation) of In0.53Ga0.47As MOS devices using improved surface preparation and a novel interfacial layer

25. Beyond-Si materials and devices for more Moore and more than Moore applications

37. (Invited) Monolithic Integration of III-V Semiconductors by Selective Area Growth on Si(001) Substrate: Epitaxy Challenges & Applications

42. Perspective of tunnel-FET for future low-power technology nodes

45. Impact of dopants and silicon structure dimensions on {113}-defect formation during 2 MeV electron irradiation in an UHVEM.

46. In situ UHVEM irradiation study of intrinsic point defect behavior in Si nanowire structures.

48. (Invited) Monolithic Integration of III-V Semiconductors by Selective Area Growth on Si(001) Substrate: Epitaxy Challenges & Applications

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