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Abstract: The n+-InAs/n0-InAs1 –ySby/p-InAsSbP heterostructures with asymmetric band offsets at the heteroboundaries of the active region have been grown by vapor-phase epitaxy from organometallic compounds on InAs substrates. The forward branch of the current–voltage characteristics of the obtained heterostructures at low temperatures has segments with the tunneling conduction. The energy-band diagram of the double InAs/InAs1 –ySby/InAsSbP heterostructure is calculated in the range of compositions (y< 0.2) of the narrow-gap active region. The InAs1 –ySby/InAsSbP heterojunction is shown to be a II type heterojunction in this composition range. The electroluminescence observed in the experiment for the n+-InAs/n0-InAs1 ‒ySby/p-InAsSbP heterostructures with the active region in compositions y> 0.14 is due to interface radiative transitions with participation of localized hole states at the II type heteroboundary.

Abstract: Asymmetric n-InAs/InAs(1 –y)Sby/p-InAsSbP heterostructures with a narrow-gap active layer and a composition range y= 0.09–0.16 were grown by vapor phase epitaxy from metalorganic compounds. Room-temperature electroluminescence was observed at a wavelength of up to ? = 5.1 µm at a spectral maximum. The study of low-temperature electroluminescence spectra provided the possibility to establish the existence of two radiative recombination channels caused by the nature of the InAsSb/InAsSbP heterointerface. The effect produced by the chemistry of the active layer on the composition of the grown barrier layer and the formation of the InAsSb/InAsSbP heterojunction with an increase in the antimony content in the InAsSb solid solution was demonstrated.