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Ridge microstructures were prepared by etching through samples consisting of a series of stacked InAs x P 1 − x quantum wells (QWs) with step graded composition grown on InP by molecular beam epitaxy. Different etching techniques were used: wet etching with HCl/H 2 O and reactive ion etching with CH 4 /H 2. These microstructures were characterized by low-temperature micro-photoluminescence. The photoluminescence (PL) emission associated with each QW was clearly identified. The PL was measured in detail across etched ridge stripes of various widths. Variations of the integrated PL intensities across the etched stripes were observed. The PL intensities for all QWs increase gradually from the edge to the center of the ridge microstructures. The PL intensity measured at the ridge center is systematically reduced for ridges which are 10 or 20 μ m wide as compared to ridges which are 30 μ m wide or larger. On the other hand, the spectral peak position of the PL lines remained constant with high accuracy (0.2–0.4 meV) across the microstructures. These observations are discussed in terms of the different possible mechanisms which determine the PL intensity variations, namely, non-radiative recombination at the etched walls and effects of stray electric fields which result from the etching process. Based on this discussion, we compare quantitatively the different etching processes which we have used. Altogether, this study illustrates the contribution that specially designed test structures, coupled with advanced spectroscopic characterization, can provide to the development of semiconductor photonic devices (e.g., lasers or waveguides) involving etching processes. [ABSTRACT FROM AUTHOR]

A model used to simulate and optimize the performance of nanowire-based betavoltaic generators is developed. The optimum nanowire array geometry is established for devices made of silicon, gallium arsenide, and gallium phosphide for both nickel-63 and tritium sources by computing the energy capture efficiency for each case. The captured power for nanowire devices is shown to be drastically greater compared to planar betavoltaic generators with maximum improvement factors of approximately 7, 3, 5, and 9 for devices utilizing radioisotope sources of nickel-63, nickel citrate, tritium, and tritiated butyl, respectively. In addition, nanowire devices do not suffer from self-shielding effects, a large limitation in conventional, planar betavoltaics. By coupling the spatial distribution of electron–hole pair generation rate calculated from Monte Carlo simulations and a semiconductor charge-transport model, the diode design is optimized for the maximum power output. The top performing devices, utilizing a tritium source, exhibited an output power of approximately 4, 6, and 2 μW cm−2 for silicon, gallium arsenide, and gallium phosphide, respectively. Overall device efficiencies were found to range from 4% to 10%, surpassing several betavoltaic devices reported in the literature. It was also found that, contrary to the traditional betavoltaic design, semiconductors with higher bandgaps do not necessarily result in the best device performance due to additional material parameters, such as surface recombination velocity. Potential improvements for nanowire-based betavoltaic generators are suggested for additional investigation. [ABSTRACT FROM AUTHOR]

The geometry of a gallium phosphide nanowire (NW) array has been optimized for maximum current generation in a betavoltaic (BV) device. The energy capture efficiency for various device geometries with different radioisotope source compounds was calculated in GEANT4. A validation of GEANT4 for BV device simulation was performed by comparing a model output with the available bulk semiconductor BV performance data, followed by predictions of the performance of NW-based devices. The pitch and the diameter of the NWs were found to have the most significant impact on the β-generated current density, with the optimum diameter-to-pitch ratios ranging from 0.55 to 0.8, depending on the source. The energy capture efficiency improved when low energy beta (β) emitters were used. For devices utilizing 63Ni source compounds, the β-generated current densities approached 0.95 μA cm−2, representing an improvement by a factor as high as 5.8 compared to planar devices. In the case of 3H source compounds, the generated current density was 3.05 μA cm−2, a factor of 15.5 larger than comparable planar devices. However, NW devices utilizing sources with a higher decay energy, such as 147Pm, did not demonstrate any improvements over planar geometries. Using the results for optimum NW geometries, NW-based or other nanostructured devices could be made to surpass the present commercial BV batteries. [ABSTRACT FROM AUTHOR]

Nonradiative processes are studied in InGaAs/InP quantum wells (QWs) as a function of the pump power and the temperature, using time-resolved photoluminescence. Intravalley disorder induced direct and intervalley phonon-assisted indirect Auger processes are found to be responsible for nonradiative recombination in low mobility and high mobility quantum wells, respectively. Both Auger processes are spatially separated: the phonon-assisted and direct Auger recombinations take place in the central part of the QW and near the interfaces, respectively. The recombination rate corresponding to the phonon-assisted Auger process is shown to increase with the temperature, while no influence of the temperature was detected for the rate of the disorder induced direct Auger process. The presented data point to the X and/or L valleys as final states for the Auger electron in the intervalley Auger process. Moreover, Auger recombination associated with different confined levels is studied. We show that the conditions for the intervalley phonon-assisted Auger processes are fulfilled for the ground states of the confined electrons and holes, while the nonradiative recombination due to the excited states is dominated by the direct Auger process. [ABSTRACT FROM AUTHOR]

The electron transport and recombination processes of photoexcited electron-hole pairs were studied in InGaAs/InP single quantum wells. Comprehensive transport data analysis reveals a asymmetric shape of the quantum well potential where the electron mobility was found to be dominated by interface-roughness scattering. The low-temperature time-resolved photoluminescence was employed to investigate recombination kinetics of photogenerated electrons. Remarkable modification of Auger recombination was observed with variation of the electron mobility. In high mobility quantum wells, the increasing pump power resulted in a new and unexpected phenomenon: a considerably enhanced Auger non-radiative recombination time. We propose that the distribution of the photoexcited electrons over different conduction band valleys might account for this effect. In low mobility quantum wells, disorder-induced relaxation of the momentum conservation rule causes inter-valley transitions to be insignificant; as a consequence, the non-radiative recombination time is reduced with the increase in pump power. Thus, interface-roughness scattering was found responsible for both transport properties and dynamic optical response in InGaAs/InP quantum wells. [ABSTRACT FROM AUTHOR]

A method is presented to improve the quantitative determination of dopant concentration in semiconductor nanowire (NW) arrays using secondary ion mass spectrometry (SIMS). SIMS measurements were used to determine Be dopant concentrations in a Be-doped GaAs thin film and NW arrays of various pitches that were dry-etched from the same film. A comparison of these measurements revealed a factor of 3 to 12 difference, depending on the NW array pitch, between the secondary Be ion yields of the film and the NW arrays, despite being identically doped. This was due to matrix effects and ion beam mixing of Be from the NWs into the surrounding benzocyclobutene that was used to fill the space between the NWs. This indicates the need for etched NWs to be used as doping standards instead of 2D films when evaluating NWs of unknown doping by SIMS. Using the etched NWs as doping standards, NW arrays of various pitches grown by the vapour-liquid-solid mechanism were characterized by SIMS to yield valuable insights into doping mechanisms. [ABSTRACT FROM AUTHOR]

Experimental data and a model are presented which define the boundary values of V/III flux ratio and growth temperature for droplet-assisted nucleation of InAs semiconductor nanowires in selective-area epitaxy on SiO(x)/Si (111) substrates by molecular beam epitaxy. Within these boundaries, the substrate receives a balanced flux of group III and V materials allowing the growth of vertically oriented nanowires as compared to the formation of droplets or crystallites.