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Your search keyword '"Kim, W. H."' showing total 116 results
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116 results on '"Kim, W. H."'

22. First Demonstration of Low Temperature (≤500°C) CMOS Devices Featuring Functional RO and SRAM Bitcells toward 3D VLSI Integration

Author

Fenouillet-Beranger, C., primary, Brunet, L., additional, Batude, P., additional, Brevard, L., additional, Garros, X., additional, Frutuoso, T. Mota, additional, Casse, M., additional, Lugo, J., additional, Lacord, J., additional, Bosch, D., additional, Bernard, N., additional, Magalhaes-Lucas, A., additional, Ribotta, M., additional, Sklenard, B., additional, Milesi, F., additional, Kies, R., additional, Romano, G., additional, Acosta-Alba, P., additional, Kerdiles, S., additional, Tavernier, A., additional, Vizioz, C., additional, Besson, P., additional, Gassilloud, R., additional, Kanyandekwe, J., additional, Cooper, D., additional, Lapras, V., additional, Kim, W. H., additional, Sasaki, Y., additional, Oh, S., additional, Kang, P., additional, Lee, S. W., additional, Na, H., additional, Arcamone, J., additional, and Andrieu, F., additional

Published
2020
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23. The U-shaped association between achieved blood pressure and risk of cardiovascular events and mortality in elderly and younger patients

Author

Lim, N, Park, H, Kim, W, Mancia, G, Cho, M, Lim N. -K., Park H. -Y., Kim W. -H., Mancia G., Cho M. -C., Lim, N, Park, H, Kim, W, Mancia, G, Cho, M, Lim N. -K., Park H. -Y., Kim W. -H., Mancia G., and Cho M. -C.

Abstract

Objective:The main objective is to assess the appropriate level of achieved SBP and DBP to prevent cardiovascular events.Methods:We used the National Sample Cohort from the National Health Insurance Service in Korea and analyzed data of 44462 hypertensive patients aged 20 - 84 years. Achieved SBP and DBP were categorized according to average achieved SBP (<120, 120-129, 130-139, 140-149, and ≥150mmHg) and DBP (<70, 70-79, 80-89, 90-99, and ≥100mmHg). We examined the association between achieved BP and composite outcome including cardiovascular death, admission of stroke, myocardial infarction, or heart failure, and all-caused death in elderly aged more than 65 years and in younger patients.Results:After a median follow-up of 6.8 years, achieved SBP less than 120mmHg and at least 150mmHg in elderly and younger patients, respectively, were significantly associated with a higher risk of composite outcome than achieved SBP of 120-129mmHg. Cox's proportional hazard analysis showed that the association between achieved SBP and risk of composite outcome and all-cause death had U-shaped relationships and identified a nadir of SBP of 135.6 and 128.9mmHg, respectively, for composite outcome and 135.1 and 131.4mmHg, respectively, for all-cause death in elderly and younger patients.Conclusion:Compared with SBP of 120-129mmHg, not only low achieved SBP of less than 120mmHg but also high BP are associated with risk of adverse cardiovascular event and all-cause death in both elderly and younger patients with a distinct U-shaped relationship.

Published
2020

36. P2690The bleeding and cardiovascular risk according to NSAIDs selectivity in patients receiving antithrombotics and concomitant NSAIDs after myocardial infarction: a nationwide cohort study

Author

Park, E J, primary, Kim, W H, additional, Choi, J Y, additional, Jang, W Y, additional, Na, J O, additional, Choi, J I, additional, Kim, J W, additional, Kim, E J, additional, Rha, S W, additional, Park, C G, additional, Seo, H S, additional, and Choi, C U, additional

Published
2018
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39. Area-selective atomic layer deposition of metal oxides on noble metals through catalytic oxygen activation

Author

Singh, J. (Joseph), Thissen, N.F.W., Kim, W.-H., Johnson, H., Kessels, W.M.M., Bol, A.A., Bent, S.F., Mackus, A.J.M., Singh, J. (Joseph), Thissen, N.F.W., Kim, W.-H., Johnson, H., Kessels, W.M.M., Bol, A.A., Bent, S.F., and Mackus, A.J.M.

Abstract

Area-selective atomic layer deposition (ALD) is envisioned to play a key role in next-generation semiconductor processing and can also provide new opportunities in the field of catalysis. In this work, we developed an approach for the area-selective deposition of metal oxides on noble metals. Using O2 gas as co-reactant, area-selective ALD has been achieved by relying on the catalytic dissociation of the oxygen molecules on the noble metal surface, while no deposition takes place on inert surfaces that do not dissociate oxygen (i.e., SiO2, Al2O3, Au). The process is demonstrated for selective deposition of iron oxide and nickel oxide on platinum and iridium substrates. Characterization by in situ spectroscopic ellipsometry, transmission electron microscopy, scanning Auger electron spectroscopy, and X-ray photoelectron spectroscopy confirms a very high degree of selectivity, with a constant ALD growth rate on the catalytic metal substrates and no deposition on inert substrates, even after 300 ALD cycles. We demonstrate the area-selective ALD approach on planar and patterned substrates and use it to prepare Pt/Fe2O3 core/shell nanoparticles. Finally, the approach is proposed to be extendable beyond the materials presented here, specifically to other metal oxide ALD processes for which the precursor requires a strong oxidizing agent for growth.

Published
2018

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