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This feature article considers the analysis of the initial states of film growth on polymer substrates. The assembled results are based on the cooperation between research groups in the field of plasma physics, chemistry, electric as well as mechanical engineering over the last years, mostly within the frame of the transregional project SFB-TR 87 ("Pulsed high power plasmas for the synthesis of nanostructured functional layers"). This feature article aims at bridging the gap between the understanding of plasma processes in the gas phase and the resulting surface and interface processes of the polymer. The results show that interfacial adhesion and initial film growth can be well controlled and even predicted based on the combination of analytical approaches., Comment: 22 pages, 16 figures

The transport of sputtered species from the target of a magnetron plasma to a collecting surface at the circumference of the plasma is analyzed using a particle tracer technique. A small chromium insert at the racetrack position inside a titanium target is used as the source of tracer particles, which are redeposited on the collecting surface. The azimuthal velocity of the ions along the racetrack above the target is determined from the Doppler shift of the optical emission lines of titanium and chromium. The trajectories are reconstructed from an analysis of the transport physics leading to the measured deposition profiles. It is shown that a simple direct-line-of sight re-deposition model can explain the data for low power plasmas (DCMS) and for pulsed high power impulse magnetron plasmas (HiPIMS) by using the Thompson velocity distribution from the sputter process as starting condition. In the case of a HiPIMS plasma, the drag force exerted on the ions and neutrals by the electron Hall current has to be included causing an azimuthal displacement in \ExB direction. Nevertheless, the Thompson sputter distribution remains preserved for 50\% of the re-deposited growth flux. The implications for the understanding of transport processes in magnetron plasmas are discussed.

Scaling or smiliarity laws of plasmas are of interest if lab size plasma sources are to be scaled for industrial processes. Ideally, the discharge parameters of the scaled plasmas are predictable and the fundamental physical processes are unaltered. Naturally, there are limitations and ranges of validity. Scaling laws for direct current glow discharges are well known. If a well diagnosed discharge is scaled, the field strength in the positive column, the gas amplification and the normal current density can easily be estimated. For non-stationary high power discharges like high power impulse magnetron sputtering (HiPIMS) plasmas, scaling is not as straight forward. Here, one deals with a non-stationary complex system with strong changes in plasma chemistry and symmetry breaks during the pulses. Because of the huge parameter space no good parameters are available to define these kind of discharges unambiguous at the moment. In this contribution we will discuss the scaling laws for DC glow discharges briefly and present experimental results for a discharge with copper electrodes and helium as plasma forming gas. This discharge was operated in a pressure range from 200 to 1600 hPa with three different electrode diameters (D=2.1, 3.0 and 4.3 mm). Results from breakdown voltage measurements indicate that the pressure and electrode distance cannot be varied independently. Effects of the scaling on the reduced normal current density, the reduced normal electric field in the positive column and discharge temperature will be discussed and limitations highlighted. Compared with these results the added complexity of HiPIMS plasmas will be described. Suggestions in the community how to obtain experimental finger prints of the plasmas will be reviewed and implications from the experiences with DC discharges on the development of similarity laws for HiPIMS plasmas will be discussed., Comment: Intended for submission to Journal of Physics D

High power pulsed magnetron sputtering (HPPMS) plasmas are pulsed discharges where the plasma composition as well as the fluxes and energies of ions are changing during the pulse. The time resolved energy distribution for Ar$^{1+}$ ions was measured and Phase Resolved Optical Emission Spectroscopy (PROES) for the Ar I line at 760 nm was done to get more insight in the transport properties of the plasma forming noble gas. These measurements were performed during HPPMS of titanium with argon at 0.5 Pa. The peak power density during the 50 $\mu$s pulses was 1.8 kW/cm$^2$. In this contribution we demonstrate how time resolved mass spectrometry and ICCD cameras can be used to shed more light on energy and particle transport in HPPMS-plasmas., Comment: The manuscript was submitted to the 7th Triennial Special Issue of the IEEE Transactions on Plasma Science "Images in Plasma Science," scheduled for publication in September 2014. The manuscript length is limited to 2 pages!

HiPIMS plasmas generate energetic metal ions at the substrate as a major difference to conventional direct current magnetron sputtering. The origin of these ions is still an open issue, which is unraveled by using two fast diagnostics: time resolved mass spectrometry with a temporal resolution of 2 $\mu$s and phase resolved optical emission spectroscopy with a temporal resolution of 1 $\mu$s. A power scan from dcMS-like to HiPIMS plasmas was performed, with a 2-inch magnetron and a titanium target as sputter source and argon as working gas. Clear differences in the transport as well in the energetic properties of Ar$^{+}$, Ar$^{2+}$, Ti$^+$ and Ti$^{2+}$ were observed. For discharges with highest peak power densities a high energetic group of Ti$^+$ and Ti$^{2+}$ could be identified. A cold group of ions is always present. It is found that hot ions are observed only, when the plasma enters the spokes regime, which can be monitored by oscillations in the IV-characteristics in the MHz range that are picked up by the used VI-probes. These oscillations are correlated with the spokes phenomenon and are explained as an amplification of the Hall current inside the spokes as hot ionization zones. To explain the presence of energetic ions, we propose a double layer (DL) confining the hot plasma inside a spoke: if an atom becomes ionized inside the spokes region it is accelerated because of the DL to higher energies whereas its energy remains unchanged if it is ionized outside. In applying this DL model to our measurements the observed phenomena as well as several measurements from other groups can be explained. Only if spokes and a double layer are present the confined particles can gain enough energy to leave the magnetic trap. We conclude from our findings that the spoke phenomenon represents the essence of HiPIMS plasmas, explaining their good performance for material synthesis applications., Comment: Intended for Journal of Physics D: Applied Physics, Special issue "Fundamentals of plasma-surface interactions"

A beam experiment is presented to study heterogeneous reactions relevant to plasma-surface interactions. Atom and ion beams are focused onto the sample to expose it to quantified beams of oxygen, nitrogen, hydrogen, noble gas ions and metal vapor. The heterogeneous surface processes are monitored in-situ and in real time by means of a quartz crystal microbalance (QCM) and Fourier transform infrared spectroscopy (FTIR). Two examples illustrate the capabilities of the particle beam setup: oxidation and nitriding of aluminum as a model of target poisoning during reactive magnetron sputtering, and plasma treatment of polymers (PET, PP)., Comment: 30 pages, 10 figures

The growth rate during reactive high power pulsed magnetron sputtering (HIPIMS) of titanium nitride is measured with a temporal resolution of up to 25 us using a rotating shutter concept. According to that concept a 200 um slit is rotated in front of the substrate synchronous with the HIPIMS pulses. Thereby, the growth flux is laterally distributed over the substrate. By measuring the resulting deposition profile with profilometry and with x-ray photoelectron spectroscopy, the temporal variation of the titanium and nitrogen growth flux per pulse is deduced. The analysis reveals that film growth occurs mainly during a HIPIMS pulse, with the growth rate following the HIPIMS phases ignition, current rise, gas rarefaction, plateau and afterglow. The growth fluxes of titanium and nitrogen follow slightly different behaviors with titanium dominating at the beginning of the HIPIMS pulse and nitrogen at the end of the pulse. This is explained by the gas rarefaction effect resulting in a dense initial metal plasma and metal films which are subsequently being nitrified.

Al2O3 thin films have been deposited at substrate temperatures between 500{\deg}C to 600{\deg}C by reactive magnetron sputtering using an additional arbitrary substrate bias to tailor the energy distribution of the incident ions. The films were characterized by X-ray diffraction (XRD) and Fourier transform infrared spectroscopy (FTIR). The film structure being amorphous, nanocrystalline, or crystalline was correlated with characteristic ion energy distributions. The evolving crystalline structure is connected with different levels of displacements per atom (dpa) in the growing film as being derived from TRIM simulations. The boundary between the formation of crystalline films and amorphous or nanocrystalline films was at 0.9 dpa for a substrate temperature of 500{\deg}C. This threshold shifts to 0.6 dpa for films grown at 550{\deg}C.

Microplasma jets are commonly used to treat samples in ambient air atmosphere. The effect of admixing air into the effluent may severely affect the composition of the emerging species. Here, the effluent of a He/O2 microplasma jet has been analyzed in a helium and in an air atmosphere by molecular beam mass spectrometry. First, the composition of the effluent in air has been recorded as a function of the distance to determine how fast air admixes into the effluent. Then, the spatial distribution of atomic oxygen and ozone in the effluent has been recorded in ambient air and compared to measurements in a helium atmosphere. Additionally, a fluid model of the gas flow with reaction kinetics of reactive oxygen species in the effluent has been constructed. In ambient air, the O density declines only slightly faster with the distance compared to a helium atmosphere. On the contrary, the O3 density in ambient air increases significantly faster with the distance compared to a helium atmosphere. This mysterious behavior can have big implication for the use of similar jets in plasma medicine. It is shown that photodissociation of O2 and O3 is not responsible for the observed effect. A reaction scheme involving the reaction of plasma produced highly vibrationally excited O2 with ground state O2 molecules is proposed as a possible explanation of the observed densities. A very good agreement between measured and simulated densities is achieved., Comment: 22 pages, 9 figures, submitted to Plasma Sources Science and Technology

Atmospheric pressure plasma jet sources are currently in the focus of many researchers for their promising applications in medical industry (e.g. treatment of living tissues), surface modification or material etching or synthesis. Here we report on the study of fundamental principles of deposition of SiOx films from microplasma jets with admixture of hexamethyldisiloxane [(CH3)3SiOSi(CH3)3, HMDSO] molecules and oxygen. The properties of the deposited films, the composition of the plasma as measured by molecular beam mass spectrometry and the effect of additional treatment of grown film by oxygen or hydrogen atoms will be presented., Comment: 5 pages, 5 figures, contribution at SAPP XVIII 2011 conference, Vratna Dolina, Mala Fatra, Slovakia

The knowledge of absolute fluxes of reactive species such as radicals or energetic ions to the surface is crucial for understanding the growth or etching of thin films. These species have due to their high reactivity very low densities and their detection is therefore a challenging task. Mass spectrometry is a very sensitive technique and it will be demonstrated that it is a good choice for the study of plasma chemistry. Mass spectrometry measures the plasma composition directly at the surface and is not limited by existence of accessible optical transitions. When properly designed and carefully calibrated mass spectrometry provides absolute densities of the measured species. It can even measure internally excited metastable species. Here, measurement of neutral species and positive ions generated in an atmospheric pressure plasmas jet operated with He, hexamethyldisiloxane and O2 will be presented., Comment: 7 pages, 4 figures, contribution at SVC 2011 TechCon conference, 16.-21.4.2011, Chicago, USA

Thermal conductivities $\Lambda $ of amorphous carbon thin films are measured in the temperatures range 80--400 K using the $3\omega $ method. Sample films range from soft a-C:H prepared by remote-plasma deposition ($\Lambda = 0.20$ W m$^{-1}$ K$^{-1}$ at room temperature) to amorphous diamond with a large fraction of $sp^3$ bonded carbon deposited from a filtered-arc source ($\Lambda = 2.2$ W m$^{-1}$ K$^{-1}$). Effective-medium theory provides a phenomenological description of the variation of conductivity with mass density. The thermal conductivities are in good agreement with the minimum thermal conductivity calculated from the measured atomic density and longitudinal speed of sound., Comment: 4 pages, 4 figures