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A novel photoresist-free process used for fabrication of Ti:LiNbO3waveguides is proposed and demonstrated. In this process, smooth waveguide patterning of TiO2channels can be performed by laser-beam (LB) direct writing at up to 0.2 mm/s, where Ti film deposited on LiNbO3is thermally oxidized in air by the focused Ar+laser beam. LB writing has sufficiently high accuracy for waveguide patterning because the Ti film thickness is usually below 0.1 µm. Unlike the previously reported resist-free processes, the process demonstrated here does not require any specific tools or materials, and can provide Ti:LiNbO3waveguides more easily. It was also confirmed that there are no marked differences in guiding properties between two Ti:LiNbO3waveguides fabricated by the proposed resist-free process and the standard process based on waveguide patterning in photoresist as thick as 1 µm.