1. Atomic layer deposited thin films for corrosion protection
- Author
-
Matero, R., Ritala, M., Leskelä, M., Salo, T., Aromaa, J., Forsén, O., Matero, R., Ritala, M., Leskelä, M., Salo, T., Aromaa, J., and Forsén, O.
- Abstract
The suitability of Atomic Layer Deposition for making corrosion protection coatings was examined. Thin films of Al2O3, TiO2, Ta2O5and Al2O3-TiO2multilayer were deposited on stainless steel substrates. The films were deposited at 150-400 °C. The corrosion behaviour of the samples was studied by Electrochemical Impedance Spectroscopy in 3.5 wt.% NaCl and 0.1 and 1 mol/l HCl solutions. Al2O3was found to protect the substrate material against corrosion for a limited time in NaCl. TiO2alone does not give good protection, but when combined with Al2O3in a multilayer structure better protection is achieved. Ta2O5films were tested in HCl and were found to protect the base material to some extent.
- Published
- 1999
- Full Text
- View/download PDF