1. Stress and Hardness of CrN films
- Author
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DELFT UNIV OF TECHNOLOGY (NETHERLANDS)DEPT OF MATERIAL SCIENCE AND TECHNOLOGY, Janssen, G. C., Kamminga, J. D., Sloof, W. G., DELFT UNIV OF TECHNOLOGY (NETHERLANDS)DEPT OF MATERIAL SCIENCE AND TECHNOLOGY, Janssen, G. C., Kamminga, J. D., and Sloof, W. G.
- Abstract
Chromium nitride films CrN(x) with x ranging form 0 to 1 were deposited by reactive PVD. Both stress and hardness in the films are a function of the composition. The growth stress and hardness for the majority of the films can be related through the Hall Petch relation. It is shown that the hardest films fall outside this relation. It is also shown that the hardest films are nanocrystalline. It is argued that the hardness of these films is a consequence of the nanocrystallinity of these films., Pub in: Materials Research Society Symposium Proceedings, Volume 703. Prepared in collaboration with Netherlands Inst. for Metals Research, Delft, the Netherlands. This article is from ADA401575 Nanophase and Nanocomposite Materials IV held in Boston, Massachusetts on November 26-29, 2001
- Published
- 2001