1. At the limit of interfacial sharpness in nanowire axial heterostructures
- Author
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Hilliard, D., Tauchnitz, T., (0000-0002-5200-6928) Hübner, R., Vasileiadis, I., Gkotinakos, A., Dimitrakopulos, G. P., Komninou, P., Sun, X., (0000-0002-8090-9198) Winnerl, S., (0000-0002-8060-8504) Schneider, H., Helm, M., (0000-0002-7546-0621) Dimakis, E., Hilliard, D., Tauchnitz, T., (0000-0002-5200-6928) Hübner, R., Vasileiadis, I., Gkotinakos, A., Dimitrakopulos, G. P., Komninou, P., Sun, X., (0000-0002-8090-9198) Winnerl, S., (0000-0002-8060-8504) Schneider, H., Helm, M., and (0000-0002-7546-0621) Dimakis, E.
- Abstract
As semiconductor devices approach dimensions at the atomic scale, controlling the compositional grading across hetero-interfaces becomes paramount. Particularly in nanowire axial heterostructures, which are promising for a broad spectrum of nanotechnology applications, the achievement of sharp hetero-interfaces has been challenging owing to peculiarities of the commonly used vapor-liquid-solid growth mode. Here, the grading of Al across GaAs/AlxGa1-xAs/GaAs heterostructures in self-catalyzed nanowires is studied, aiming at finding the limits of the interfacial sharpness for this technologically versatile material system. A pulsed growth mode ensures precise control of the growth mechanisms even at low temperatures, while a semi-empirical thermodynamic model is derived to fit the experimental Al-content profiles and quantitatively describe the dependences of the interfacial sharpness on the growth temperature, the nanowire radius, and the Al content. Finally, symmetrical Al profiles with interfacial widths of 2–3 atomic planes, at the limit of the measurement accuracy, are obtained, outperforming even equivalent thin-film heterostructures. The proposed method paves the way to advanced heterostructure schemes and a better exploitation of the nanowire platform; moreover, it is also considered expandable to other material systems and nanostructure types.
- Published
- 2024