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635 results on '"Yamashita T"'

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1. Comparison of Exhaled Volatile Organic Compounds Among Severe Asthma Phenotypes in Japan: A J-VOCSA Study

3. Subtractive Ru Interconnect Enabled by Novel Patterning Solution for EUV Double Patterning and TopVia with Embedded Airgap Integration for Post Cu Interconnect Scaling

5. Pixel Pitch Hybrid Bonding and Three Layer Stacking Technology for BSI Image Sensor

6. Vertical-Transport Nanosheet Technology for CMOS Scaling beyond Lateral-Transport Devices

8. Safety outcomes from monarchE: phase 3 study of abemaciclib combined with endocrine therapy (ET) for the adjuvant treatment of HR+, HER-2-, node-positive, high risk, early breast cancer (EBC)

10. Mushroom-Type phase change memory with projection liner: An array-level demonstration of conductance drift and noise mitigation

12. Sub-6V Operation of Split-Gate Type Charge-Trapping Nonvolatile Memory with High-k Trapping and Blocking Layers for High-Speed and HighlyReliable Embedded Flash

15. Full Bottom Dielectric Isolation to Enable Stacked Nanosheet Transistor for Low Power and High Performance Applications

19. Co-Existence of 87 Mbit/s Quantum and 10 Gbit/s Classical Communications in 37-Core Fiber

20. 13.1 A 1.33Tb 4-bit/Cell 3D-Flash Memory on a 96-Word-Line-Layer Technology

22. Parasitic Resistance Reduction Strategies for Advanced CMOS FinFETs Beyond 7nm

27. Reliability and scalability of FinFET split-gate MONOS array with tight Vth distribution for 16/14nm-node embedded flash

40. Stacked nanosheet gate-all-around transistor to enable scaling beyond FinFET

43. A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels

44. Air spacer for 10nm FinFET CMOS and beyond

45. FinFET performance with Si:P and Ge:Group-III-Metal metastable contact trench alloys

46. LiteBIRD: lite satellite for the study of B-mode polarization and inflation from cosmic microwave background radiation detection

47. FINFET technology featuring high mobility SiGe channel for 10nm and beyond

49. Ti and NiPt/Ti liner silicide contacts for advanced technologies

50. Process optimizations for NBTI/PBTI for future replacement metal gate technologies

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