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Your search keyword '"Ueno, Yusuke"' showing total 7 results
Start Over Author "Ueno, Yusuke" Publication Type Conference Materials
7 results on '"Ueno, Yusuke"'

6. MIND+ system; More universal dose patterns by single-step ion implantation

Author

Okamoto, Yasuharu, primary, Ninomiya, Shiro, additional, Ochi, Akihiro, additional, Ueno, Yusuke, additional, Yamada, Tatsuya, additional, Kimura, Yasuhiko, additional, Kudo, Tetsuya, additional, Koike, Masazumi, additional, Suetsugu, Noriyuki, additional, Ookita, Yoshiaki, additional, Tsukihara, Mitsukuni, additional, Sato, Fumiaki, additional, Fuse, Genshu, additional, Ueno, Kazuyoshi, additional, and Sugitani, Michiro, additional

Published
2012
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7. MIND+ system; More universal dose patterns by single-step ion implantation.

Author

Okamoto, Yasuharu, Ninomiya, Shiro, Ochi, Akihiro, Ueno, Yusuke, Yamada, Tatsuya, Kimura, Yasuhiko, Kudo, Tetsuya, Koike, Masazumi, Suetsugu, Noriyuki, Ookita, Yoshiaki, Tsukihara, Mitsukuni, Sato, Fumiaki, Fuse, Genshu, Ueno, Kazuyoshi, and Sugitani, Michiro

Subjects
ION implantation, SEMICONDUCTORS, SEMICONDUCTOR wafers, DEGREES of freedom, ION plating, ION bombardment
Abstract

Electrical characteristics of semi-conductor devices within a wafer are expected to be uniform based on control of the dose pattern during the ion implant process. SEN developed the MIND system (Mapping of Intentional Non-uniform Dosage), to provide such dose pattern control. This capability has been enhanced with MIND+. The new system provides improved two-dimensional dose pattern control with more degrees of freedom and greater accuracy than the original MIND system. In addition, MIND+ can generate practical dose patterns (see below) while using a single step implant. As a result, MIND+ provides a very powerful tool for yield enhancement without sacrificing throughput. This paper will provide more detail on the capabilities and practical applications of the MIND+ system. [ABSTRACT FROM AUTHOR]

Published
2012
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