17 results on '"Steinert, Steffen"'
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2. Direct correlation between mask registration and on-wafer measurements for individual logic device features
3. New registration calibration strategies for MBMW tools by PROVE measurements
4. The mask contribution as part of the intra-field on-product overlay performance
5. Wafer alignment mark placement accuracy impact on the layer-to-layer overlay performance
6. Dense mask registration fingerprint characterization to better understand and mitigate the metrology to device offset.
7. The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay
8. Intra-field mask-to-mask overlay, separating the mask writing from the dynamic pellicle contribution
9. The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay.
10. Wafer alignment mark placement accuracy impact on the layer-to-layer overlay performance.
11. Off-line mask-to-mask registration characterization as enabler for computational overlay
12. Registration performance on EUV masks using high-resolution registration metrology
13. Intra-field mask-to-mask overlay, separating the mask writing from the dynamic pellicle contribution.
14. Co-optimization of RegC and TWINSCAN corrections to improve the intra-field on-product overlay performance
15. On the benefit of high resolution and low aberrations for in-die mask registration metrology
16. Direct correlation between mask registration and on-wafer measurements for individual logic device features.
17. The mask contribution as part of the intra-field on-product overlay performance.
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