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The sputtering yield was calculated for the BeCu alloy, which were bombarded by N2, O2, and Ar ions in energy range (0.1-50) Kev. The TRIM was used to get the sputtering yield of BeCu alloy target. TRIM is founded on Monte Carlo simulation (MCs) method. The results showed the sputtering yield depends on the incident ions energy, the incident angle, atomic number of incident ions and Concentrations of elements used in alloy. In this study with the rise of incident ion energy the Sputtering Yield increases, reaches a maximum and then diminution. We have reached that the Sputtering yield for BeCu alloy were the highest value of argon Comparative to nitrogen and oxygen that which are very close when the same angle, and In general, the ion energy corresponding to the highest sputtering yield increases by increasing the incident ion angle. In all the situation investigated, the yield increases with the ion incidence angle because the acquired energy distribution is transfer nearer to the surface. At an angle between 60° and 80° there is a supreme yield and then reducing swiftly for angles larger than 80°. Is believed to be caused from the increase of ion reflection from the target alloy surface. We note the SY increase with increasing atomic number of ions (Ar, N2, O2) that bombardment the BeCu alloy. And the sputtering yield decreases with increasing the concentration of Beryllium in alloy. Moreover, were fit the accounts and found curves coefficients by Semi-experimental equations. [ABSTRACT FROM AUTHOR]