129 results on '"Kozawa, Takahiro"'
Search Results
2. Feasibility study of a positive tone organometal chemically amplified resist for high-resolution EUV single patterning
3. Substituent effects of acid generators on radiation-induced degradation and dissolution kinetics in chemically amplified resist process
4. Study on resist performance of inorganic-organic resist materials for EUV and EB lithography
5. Dissolution dynamics of copolymer of poly(4-hydroxystyrene-co-methacrylic acid) in tetraalkylammonium hydroxide aqueous solutions
6. Influence of surface free energy of underlayer on the dissolution of resist film in tetramethylammonium hydroxide (TMAH) aqueous solution
7. Analysis of dissolution modes of partially protected poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solutions using decision trees and support vector machine
8. Automatic evaluation of line-and-space resist patterns with defects using image recognition technology
9. Chemical information extraction from scanning electron microscopy images on the basis of image recognition
10. Effects of photoacid generator decomposition on dissolution kinetics of poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solutions
11. Dependence of swelling and dissolution kinetics of poly(4-hydroxystyrene) in alkaline aqueous solution on alkyl chain length of tetraalkylammonium hydroxide
12. Reaction mechanisms and EB patterning evaluation of Sn-complex-side-chain polymer used for EUV lithography
13. Design concept of a positive tone organometal chemically amplified resist to enhance the sensitivity and etching durability for high resolution EUV single patterning
14. Study of RLS trade-off mitigation utilizing an organotin-containing chemically amplified resist for high sensitivity patterning
15. Effect of surface free energy of organic underlayer on dissolution kinetics of poly(4-hydroxystyrene) film in tetramethylammonium hydroxide aqueous developer
16. Bayesian optimization-based estimation of effective reaction radius of chemically amplified resist in acid catalyzed deprotection reaction
17. Defect risks in chemically amplified resists used for extreme ultraviolet lithography
18. State of polymer chains in alkaline developer studied by dynamic light scattering
19. Prediction of line-and-space pattern after etching based on scanning electron microscope image of corresponding resist pattern using machine learning
20. Swelling and dissolution kinetics of poly(4-hydroxystyrene) in alkaline aqueous solution studied by quartz crystal microbalance (QCM) method
21. Stochastic effects in chemically amplified resists used for extreme ultraviolet lithography
22. Analysis of dissolution kinetics of poly(4-hydroxystyrene) with different molecular weight distributions in alkaline aqueous solution using machine learning
23. Effect of resist film thickness on line-and-space resist patterns on chromium nitride in electron beam lithography
24. Regression analysis of photodecomposable quencher concentration effects on chemical gradient in chemically amplified extreme ultraviolet resist processes
25. Resist thickness dependence of line width roughness of chemically amplified resists used for electron beam lithography
26. Study on dependence of transient swelling layer formation on molecular weight and dispersion of backbone polymer of chemically amplified EUV resists
27. EUV sensitization mechanisms of carboxylic acids used as ligands of metal oxide nanocluster resists (Conference Presentation)
28. Analysis of trade-off relationships between resolution, line edge roughness, and sensitivity in extreme ultraviolet lithography using machine learning
29. Sensitivity enhancement of chemically amplified EUV resist by adding diphenyl sulfone derivatives
30. Mechanism of resist heating effect in chemically amplified resist
31. Study of RLS trade-off mitigation utilizing a novel negative chemically amplified resist for high resolution patterning
32. Strategy for the breakthrough of RLS trade-off relationship in the development of novel resist materials and a developer
33. Analysis of line-and-space patterns of ZrO2 nanoparticle resist on the basis of EUV sensitization mechanism
34. Fundamental study on dissolution kinetics of poly(4-hydroxystyrene) for development of high-resolution resists
35. Improvement of dual insolubilization resist performance through the incorporation of various functional units
36. Pattern formation mechanism of zirconia nanoparticle resist used for extreme-ultraviolet lithography (Conference Presentation)
37. Material design for the improvement of ZEP520A performance
38. Sensitization and reaction mechanisms of ZrO2 nanoparticle resist used for extreme-ultraviolet lithography (Conference Presentation)
39. Sensitizers in EUV chemically amplified resist: mechanism of sensitivity improvement
40. Study of electron beam and extreme ultraviolet resist utilizing polarity change and radical crosslinking
41. Synthesis of metal nanoparticle and patterning in polymeric films induced by electron beam
42. Influence of surface free energy of underlayer on the dissolution of resist film in tetramethylammonium hydroxide (TMAH) aqueous solution.
43. Automatic evaluation of line-and-space resist patterns with defects using image recognition technology.
44. Analysis of dissolution modes of partially protected poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solutions using decision trees and support vector machine.
45. Lamellar orientation of block copolymer using polarity switch of nitrophenyl self-assembled monolayer induced by electron beam
46. Study on stochastic phenomena induced in chemically amplified poly(4-hydroxystyrene-co-t-butyl methacrylate) resist (high performance model resist for extreme ultraviolet lithography)
47. EB and EUV lithography using inedible cellulose-based biomass resist material
48. Fundamental study on dissolution behavior of poly(methyl methacrylate) by quartz crystal microbalance
49. Dynamics of radical ions of fluorinated polymer for Extreme Ultraviolet (EUV) lithography
50. Evaluation of novel lactone derivatives for chemically amplified EUV resists
Catalog
Books, media, physical & digital resources
Discovery Service for Jio Institute Digital Library
For full access to our library's resources, please sign in.