7 results on '"Hur, Jiuk"'
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2. Improving mask yield by implementing an advanced mask blank inspection system
3. MTO-like reference mask modeling for advanced inverse lithography technology patterns
4. A novel design-based global CDU metrology for 1X nm node logic devices
5. Improving inspectability of sub-2x-nm node masks with complex SRAF
6. Implementation strategy of wafer-plane and aerial-plane inspection for advanced mask manufacture
7. Implementation strategy of wafer-plane and aerial-plane inspection for advanced mask manufacture.
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