32 results on '"Capetti, A"'
Search Results
2. Essential oils bearing specialized metabolites with potential tyrosinase inhibitory activity
3. Citral Containing Essential Oils as Potential Tyrosinase Inhibitors: a bio-guided fractionation approach to investigate the additive and/or synergistic contribution of minor compounds
4. Bio-guided fractionation of essential oils looking for plant bioactive secondary metabolites with potential hypoglycemic activity
5. In vitro permeation, skin-layers distribution and environmental emission of bioactive Tea Tree essential oil components from topic formulations
6. Laser bandwidth effect on overlay budget and imaging for the 45 nm and 32nm technology nodes with immersion lithography
7. The Chandra 3C Snapshot Survey for Sources with z<0.3
8. Extended X-ray emission in radio galaxies: 3C 305
9. Managing Collective Knowledge in the Web 3.0
10. Galileo timing applications and ACTS prototyping
11. Precise time and frequency distribution over a wireless network for A-GNSS users
12. High-order distortion effects induced by extreme off-axis illuminations at hyper NA lithography
13. A demonstrator for an integrated subway protection system
14. Combined mask and illumination scheme optimization for robust contact patterning on 45nm technology node flash memory devices
15. Impact of medium and long range effects on poly gate patterning
16. Sub-k1 = 0.25 lithography with double patterning technique for 45-nm technology node flash memory devices at λ = 193nm
17. Alternated phase-shift mask for 45nm node contact holes patterning
18. Evaluation of Hitachi CAD to CD-SEM metrology package for OPC model tuning and product devices OPC verification
19. Full-chip implementation of IDEALsmile on 90nm node devices with ArF lithography
20. High-order distortion effects induced by extreme off-axis illuminations at hyper NA lithography.
21. Implementing the Galileo Precise Timing Facility.
22. Impact of medium and long range effects on poly gate patterning.
23. A demonstrator for an integrated subway protection system.
24. Sub-k1 = 0.25 lithography with double patterning technique for 45-nm technology node flash memory devices at = 193nm.
25. Evaluation of double focal plane exposure technique for 248-nm and 193-nm lithography for semidense trenches and contacts
26. A 65nm NOR flash technology with 0.042/spl mu/m/sup 2/ cell size for high performance multilevel application.
27. Evaluation of IDEALSmile for 90-nm FLASH memory contact holes imaging with ArF scanner.
28. Customized illumination schemes for critical layers of 90-nm node dense memory devices in ArF lithography: comparison between simulation and experimental results.
29. Evaluation of double focal plane exposure technique for 248-nm and 193-nm lithography for semidense trenches and contacts.
30. X-ray properties of FR I radio galaxies.
31. A 65nm NOR flash technology with 0.042μm/sup 2/ cell size for high performance multilevel application
32. Full-chip implementation of IDEALsmile on 90nm node devices with ArF lithography.
Catalog
Books, media, physical & digital resources
Discovery Service for Jio Institute Digital Library
For full access to our library's resources, please sign in.