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The present work is concerned with finding optimal technological conditions for the synthesis of heterostructures with a metamorphic buffer for InGaAs/InP photodetectors in the wavelength range of 2.2–2.6 um using molecular beam epitaxy. Three choices of buffer structure differing in design and growth parameters were proposed. The internal structure of the grown samples was investigated by X-ray diffraction and transmission electron microscopy. Experimental data analysis has shown that the greatest degree of elastic strain relaxation in the InGaAs active layer was achieved in the sample where the metamorphic buffer formation ended with a consecutive increase and decrease in temperature. The said buffer also had InAs/InAlAs superlattice inserts. The dislocation density in this sample turned out to be minimal out of three, which allowed us to conclude that the described heterostructure configuration appears to be the most appropriate for manufacturing of short wavelength infrared range pin-photodetectors with high photosensitivity.

In this study, we analyzed the result of the influence of the non-polar plane of a sapphire substrate on the structural, morphological, and optical properties and Raman scattering of the grown epitaxial GaN film. It was found that selected technological conditions for the performed chloride-hydride epitaxy let us obtain the samples of structurally qualitative semi-polar wurtzite gallium nitride with (11¯22) orientation on m-sapphire. Using a set of structural and spectral methods of analysis the structural, morphological, and optical properties of the films were studied and the value of residual bi-axial stresses was determined. A complex of the obtained results means a high structural and optical quality of the epitaxial gallium nitride film. Optimization of the applied technological technique in the future can be a promising approach for the growth of the qualitative GaN structures on m-sapphire substrates.

In this work, we studied the efficiency of introducing nanoporous silicon as a buffer layer in the growth of AlxGa1–xN/AlN/Si(111) on a single-crystal silicon by molecular beam growth technology. We also considered its influence on the morphological characteristics and atomic composition of the surface layers of heterostructures. As determined by X-ray diffraction, microscopic, and X-ray photoelectron methods, the heterostructure grown on Si(111) n-type monocrystalline silicon wafer with nanoporous por-Si buffer layer has a more homogeneous epitaxial layer, and the surface morphology of the layer is also more homogeneous.