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Ti/TiN multilayer film was deposited on uranium surface by arc ion plating technique to improve fretting wear behavior. The morphology, structure and element distribution of the film were measured by scanning electric microscopy (SEM), X-ray diffractometry (XRD) and Auger electron spectroscopy (AES). Fretting wear tests of uranium and Ti/TiN multilayer film were carried out using pin-on-disc configuration. The fretting tests of uranium and Ti/TiN multilayer film were carried out under normal load of 20 N and various displacement amplitudes ranging from 5 to 100 μm. With the increase of the displacement amplitude, the fretting changed from partial slip regime (PSR) to slip regime (SR). The coefficient of friction (COF) increased with the increase of displacement amplitude. The results indicated that the displacement amplitude had a strong effect on fretting wear behavior of the film. The damage of the film was very slight when the displacement amplitude was below 20 μm. The observations indicated that the delamination was the main wear mechanism of Ti/TiN multilayer film in PSR. The main wear mechanism of Ti/TiN multilayer film in SR was delamination and abrasive wear.

In the present paper, Cr, CrN single-layer films and Cr/CrN multilayer films were deposited on iron and silicon wafer substrates by means of unbalanced magnetron sputtering. The film thickness was measured using surface profile meter. The porosity ratio was calculated using coulometric method based on the polarization curves obtained in the 30g/L NaCl solution at room temperature. Moreover, the corrosion resistance of the sample in a 350°C water vapor atmosphere was also analyzed. The thickness of all films ranged from 1.03 to 1.54 micrometer. The porosity ratio of the Cr and CrN single-layer film were 3.72% and 5.83%, respectively. The porosity of the Cr/CrN multilayer film decreased to 0.39%. The results showed that the Cr/CrN multilayer films had better protection than the Cr and CrN single-layer films.

CrNx film was widely used in mechanical engineering field because of its excellent anti-wear and corrosion resistance properties. While most of research was focused on mechanical properties, little attention had been paid to the corrosion resistance and residual stress of CrNx film . In this paper, CrNx films were deposited on silicon wafer (100) and iron substrate by unbalanced magnetron sputtering system (UBMS) at different N2 flow. Then the structure, thickness, residual stress, micro-hardness, wear-resistance and anti-corrosion properties of CrNx films were investigated. The results showed that the phase composition of CrNx films transformed from Cr, single phase Cr2N, Cr2N and CrN coexist to single CrN with the N2 flow rate increasing. The CrNx films composed with Cr2N phase, which deposited at 6 sccm N2 flow, had the highest microhardness and had higher compressive residual stress. Whereas the CrNx films with CrN and Cr2N phase coexist had the best wear and corrosion resistance.