8 results on '"Ion radiation effects"'
Search Results
2. Heavy-Ion Soft Errors in Back-Biased Thin-BOX SOI SRAMs: Hundredfold Sensitivity Due to Line-Type Multicell Upsets
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Takeshi Ohshima, Takahiro Makino, Kazunori Masukawa, Yuya Kakehashi, Kazuyuki Hirose, Masahiro Kato, Takanori Narita, Daisuke Kobayashi, Osamu Kawasaki, Shigeru Ishii, Taichi Ito, and Daisuke Matsuura
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Nuclear and High Energy Physics ,Ion radiation effects ,Materials science ,Silicon on insulator ,soft errors ,01 natural sciences ,Capacitance ,Upset ,law.invention ,single-event upsets ,law ,semiconductor device reliability ,0103 physical sciences ,MOSFET ,Static random-access memory ,Electrical and Electronic Engineering ,radiation hardening ,010302 applied physics ,010308 nuclear & particles physics ,business.industry ,Transistor ,Nuclear Energy and Engineering ,silicon-on-insulator (SOI) technologies ,Absorbed dose ,Optoelectronics ,business ,Voltage - Abstract
著者人数: 12名, Accepted: 2017-11-14, 資料番号: SA1170193000
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- 2018
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3. Charge Transport Mechanisms in Heavy-Ion Driven Leakage Current in Silicon Carbide Schottky Power Diodes
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Arto Javanainen, Veronique Ferlet-Cavrois, Kenneth F. Galloway, Robert A. Reed, Jean-Marie Lauenstein, Ronald D. Schrimpf, Francesco Pintacuda, and Ari Virtanen
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silicon carbide (SiC) ,Materials science ,Annealing (metallurgy) ,Schottky barrier ,Schottky diodes ,Metal–semiconductor junction ,01 natural sciences ,Temperature measurement ,power semiconductor devices ,chemistry.chemical_compound ,stomatognathic system ,0103 physical sciences ,Silicon carbide ,current-voltage characteristics ,Electrical and Electronic Engineering ,Safety, Risk, Reliability and Quality ,Diode ,010302 applied physics ,ta114 ,ta213 ,010308 nuclear & particles physics ,business.industry ,Schottky diode ,modeling ,Electronic, Optical and Magnetic Materials ,chemistry ,Optoelectronics ,business ,ion radiation effects ,Voltage - Abstract
Under heavy-ion exposure at sufficiently high reverse bias voltages silicon carbide (SiC) Schottky diodes are observed to exhibit gradual increases in leakage current with increasing ion fluence. Heavy-ion exposure alters the overall reverse current-voltage characteristics of these diodes, leaving the forward characteristics practically unchanged. This paper discusses the charge transport mechanisms in the heavy-ion damaged SiC Schottky diodes. A macro model, describing the reverse current-voltage characteristics in the degraded SiC Schottky diodes is proposed. peerReviewed
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- 2016
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4. Radiation hardness of n-type SiC Schottky barrier diodes irradiated with MeV He ion microbeam
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Hidekazu Tsuchida, Norihiro Hoshino, Jacopo Forneris, Ivana Capan, Takeshi Ohshima, David D. Cohen, Rainer Siegele, Željko Pastuović, and Naoya Iwamoto
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010302 applied physics ,Nuclear and High Energy Physics ,Materials science ,Deep-level transient spectroscopy ,Ion beam ,business.industry ,Schottky barrier ,02 engineering and technology ,Microbeam ,Alpha particle ,Silicon carbide ,CCE ,Ion radiation effects ,Radiation hardness ,Deep defects ,021001 nanoscience & nanotechnology ,01 natural sciences ,Ion ,Ion implantation ,0103 physical sciences ,Optoelectronics ,Irradiation ,0210 nano-technology ,business ,Instrumentation - Abstract
We studied the radiation hardness of 4H-SiC Schottky barrier diodes (SBD) for the light ion detection and spectroscopy in harsh radiation environments. n-Type SBD prepared on nitrogen-doped (∼4 × 1014 cm−3) epitaxial grown 4H-SiC thin wafers have been irradiated by a raster scanning alpha particle microbeam (2 and 4 MeV He2+ ions separately) in order to create patterned damage structures at different depths within a sensitive volume of tested diodes. Deep Level Transient Spectroscopy (DLTS) analysis revealed the formation of two deep electron traps in the irradiated and not thermally treated 4H-SiC within the ion implantation range (E1 and E2). The E2 state resembles the well-known Z1/2 center, while the E1 state could not be assigned to any particular defect reported in the literature. Ion Beam Induced Charge (IBIC) microscopy with multiple He ion probe microbeams (1–6 MeV) having different penetration depths in tested partly damaged 4H-SiC SBD has been used to determine the degradation of the charge collection efficiency (CCE) over a wide fluence range of damaging alpha particle. A non-linear behavior of the CCE decrease and a significant degradation of the spectroscopic performance with increasing He ion fluence were observed above the value of 1011 cm−2.
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- 2015
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5. Effect of local rotations on the optical response of LiNbO 3 : Application to ion-beam damage
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Fernando Agulló-Rueda, Fernando Agulló-López, Angel García-Cabañes, G. García, A. García-Navarro, José Olivares, and Mercedes Carrascosa
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Birefringence ,Materials science ,Ion beam ,Ion radiation effects ,General Physics and Astronomy ,Refraction ,Ion ,Theory and models of radiation effects ,Distribution function ,Optical constants (including refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity) ,Stopping power (particle radiation) ,Irradiation ,Atomic physics ,Refractive index - Abstract
The effect of local rigid rotations of the LiNbO3 structure on the optical response has been theoretically explored and compared to experimental data obtained after irradiation with F (20-22 MeV), O (20 MeV) and Mg (39 MeV) ions. The calculations account for the main trends of the ordinary and extraordinary refractive indices measured after the initial stage of irradiation, namely, decrease in birrefringence and approximate invariance of the average refractive index. Moreover, experimental data are quantitatively consistent with a distribution function exp[-θ/θ0] for the rotation angle with respect to the trigonal (Z-axis) and isotropic azimuthal angle φ. The corresponding θ0 angle is in the range 4.6-7.0° depending on ion and energy (stopping power). The model also predicts a significant reduction in second-harmonic generation (SHG) yield with fluence, comparable although somewhat lower than found by experiment. © EDP Sciences.
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- 2006
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6. Spectroscopic properties and radiation damage investigation of a diamond based Schottky diode for ion-beam therapy microdosimetry
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Marco Marinelli, Veljko Grilj, Claudio Verona, Gianluca Verona-Rinati, R. Mayer, P. Solevi, M. Jakšić, and G. Magrin
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diamond ,dosimetry ,ion radiation effects ,Materials science ,Ion beam ,Silicon ,business.industry ,Settore FIS/01 - Fisica Sperimentale ,General Physics and Astronomy ,Schottky diode ,chemistry.chemical_element ,Diamond ,Microbeam ,engineering.material ,Settore FIS/07 - Fisica Applicata(Beni Culturali, Ambientali, Biol.e Medicin) ,Ion ,Surface coating ,chemistry ,engineering ,Optoelectronics ,Atomic physics ,Exponential decay ,business - Abstract
In this work, a detailed analysis of the properties of a novel microdosimeter based on a synthetic single crystal diamond is reported. Focused ion microbeams were used to investigate the device spectropscopic properties as well as the induced radiation damageeffects. A diamond based Schottky diode was fabricated by chemical vapor deposition with a very thin detecting region, about 400 nm thick (approximately 1.4 μm water equivalent thickness), corresponding to the typical size in microdosimetric measurements. A 200 × 200 μm2 square metallic contact was patterned on the diamond surface by standard photolithography to define the sensitive area. Experimental measurements were carried out at the Ruder Boškovic′ Institute microbeam facility using 4 MeV carbon and 5 MeV silicon ions. Ion beam induced charge maps were employed to characterize the microdosimeter response in terms of its charge collection properties. A stable response with no evidence of polarization or memory effects was observed up to the maximum investigated ion beam flux of about 1.7 × 109 ions·cm−2·s−1. A homogeneity of the response about 6% was found over the sensitive region with a well-defined confinement of the response within the active area. Tests of the radiation damageeffect were performed by selectively irradiating small areas of the device with different ion fluences, up to about 1012 ions/cm2. An exponential decrease of the charge collection efficiency was observed with a characteristic decay constant of about 4.8 MGy and 1 MGy for C and Si ions, respectively. The experimental data were analyzed by means of GEANT4 Monte Carlo simulations. A direct correlation between the diamond damaging effect and the Non Ionizing Energy Loss (NIEL) fraction was found. In particular, an exponential decay of the charge collection efficiency with an exponential decay as a function of NIEL is observed, with a characteristic constant of about 9.3 kGy-NIEL for both carbon and silicon ions.
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- 2015
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7. Anomalous Ion Accelerated Bulk Diffusion of Interstitial Nitrogen
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Wolfhard Möller, G. Abrasonis, and Xin Xin Ma
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Ion radiation effects ,Materials science ,Ion beam ,Anharmonic lattice modes ,Analytical chemistry ,Diffusion of impurities ,General Physics and Astronomy ,chemistry.chemical_element ,engineering.material ,Nitrogen ,Ion ,Condensed Matter::Materials Science ,Ion implantation ,chemistry ,Condensed Matter::Superconductivity ,engineering ,Astrophysics::Solar and Stellar Astrophysics ,Austenitic stainless steel ,Atomic physics ,Diffusion (business) ,Penetration depth ,Nitriding - Abstract
Interstitial N diffusion under low energy ({approx}700 eV) Ar{sup +} bombardment at 673 K in ion beam nitrided austenitic stainless steel is investigated. Ar{sup +} ion bombardment increases the N mobility in depths far beyond the ion penetration depth, resulting in an increased broadening of the N depth profile as a function of Ar{sup +} flux. This effect cannot be explained by any established mechanism of radiation-enhanced diffusion. An explanation based on quasiparticle-enhanced mobility is proposed.
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- 2006
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8. n-type conductivity in high-fluence Si-implanted diamond
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H. Weishart, V. Heera, and Wolfgang Skorupa
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Electron mobility ,Ion radiation effects ,Materials science ,Material properties of diamond ,Doping ,Analytical chemistry ,General Physics and Astronomy ,Diamond ,Nanotechnology ,engineering.material ,Conductivity ,Epitaxy ,Ion implantation ,Van der Pauw method ,thin films ,electronic properties ,engineering ,Heterostructures - Abstract
Epitaxial SiC nanocrystals are fabricated by high-fluence Si-implantation into natural diamond at elevated temperatures between 760 °C and 1100 °C. Fluences under investigation range from 4.5 to 6.2 x 1017 Si cm-2 . This implantation scheme yields a buried layer rich of epitaxial aligned SiC- nanocrystals within slightly damaged diamond. The generation of a small fraction of graphitic sp2-bonds of up to 15 % in the diamond host matrix can not be avoided. Unintentional coimplantation with nitrogen results in a very high doping level of more than 1021 cm-3. Resistivity and Hall measurements in van der Pauw geometry reveal a high, thermally stable n-type conductivity with electron concentrations exceeding 1020 cm-3and mobilities higher than 2 cm2/Vs. It is supposed, that both the SiC regions as well as the diamond matrix exhibit n-type conductivity and that the electron transport occurs across the low-resistivity SiC nanograins. In the SiC nanocrystals the electrons originate from nitrogen donors whereas in diamond defects are responsible for the electron conductivity. The formation of disordered graphite, which leads to low electron mobility, is substantially reduced.
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- 2005
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