1. Thickness-Optimized Multilevel Resistive Switching of Silver Programmable Metallization Cells With Stacked SiO x /SiO2 Solid Electrolytes
- Author
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Chiu Chun-Hsiang, Jer-Chyi Wang, and Chen Wei-Fan
- Subjects
Materials science ,Silicon ,business.industry ,Electrical engineering ,chemistry.chemical_element ,Capacitance ,Electronic, Optical and Magnetic Materials ,Non-volatile memory ,chemistry ,Resistive switching ,Fast ion conductor ,Optoelectronics ,Electrical and Electronic Engineering ,business ,Low resistance ,Silicon oxide ,Order of magnitude - Abstract
Multilevel resistive switching (RS) characteristics of silver programmable metallization cells (Ag-PMCs) with stacked SiO x /SiO2 solid electrolytes have been investigated. Combined with conventional high/low resistance states and additional two middle resistance states (MRS1/MRS2), a multilevel cell operation of stacked-solid-electrolyte Ag-PMCs is achieved and optimized by the film thickness. Furthermore, the RS mechanism at middle resistance states has been proposed to be locally discontinuous Ag conductive filament (Ag-CF) within the stacked solid electrolytes by examining the carrier transportation and two-frequency calibrated capacitance. The stacked silicon oxide layers can prevent the Ag-CF from regeneration during the multilevel retention test, contributing to the superior retention properties to more than $10^{4}$ s at 125 °C. In addition, a sequentially multilevel cycling test of more than $10^{3}$ times with a resistance ratio of two orders of magnitude between each resistance state is realized by the stacked-solid-electrolyte Ag-PMCs, suitable for future high-density nonvolatile memory applications.
- Published
- 2015