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4 results on '"42.82.Et"'

1. Integrated optical amplifiers and microspherical lasers based on erbium-doped oxide glasses

Author

Adolfo Speghini, Alessandro Chiasera, Massimo Brenci, Marco Bettinelli, Maurizio Montagna, Maurizio Ferrari, Stefano Pelli, L. Zampedri, Patrice Féron, Cristina Siligardi, Giancarlo C. Righini, Simone Berneschi, Carole Arnaud, G. Nunzi Conti, Herve Portales, Istituto di Fisica Applicata 'Nello Carrara' (IFAC), National Research Council of Italy | Consiglio Nazionale delle Ricerche (CNR), Fonctions Optiques pour les Technologies de l'informatiON (FOTON), Université de Rennes (UR)-Institut National des Sciences Appliquées - Rennes (INSA Rennes), Institut National des Sciences Appliquées (INSA)-Institut National des Sciences Appliquées (INSA)-École Nationale Supérieure des Sciences Appliquées et de Technologie (ENSSAT)-Télécom Bretagne-Centre National de la Recherche Scientifique (CNRS), Dipartimento di Elettronica, Informatica e Sistemistica (DEIS), Alma Mater Studiorum Università di Bologna [Bologna] (UNIBO), Dipartimento Scientifico e Tecnologico (DST), Università degli studi di Verona = University of Verona (UNIVR), Istituto di Fotonica e Nanotecnologie (IFN), Università degli Studi di Trento (UNITN), Dipartimento di Ingegneria dei Materiali e dell'Ambiente (DIMA), Università degli Studi di Modena e Reggio Emilia = University of Modena and Reggio Emilia (UNIMORE), Consiglio Nazionale delle Ricerche [Roma] (CNR), Institut National des Sciences Appliquées - Rennes (INSA Rennes), Institut National des Sciences Appliquées (INSA)-Université de Rennes (UNIV-RENNES)-Institut National des Sciences Appliquées (INSA)-Université de Rennes (UNIV-RENNES)-Centre National de la Recherche Scientifique (CNRS)-Université de Rennes 1 (UR1), Université de Rennes (UNIV-RENNES)-École Nationale Supérieure des Sciences Appliquées et de Technologie (ENSSAT)-Télécom Bretagne, University of Verona (UNIVR), Dipartimento di Fisica (Università Degli Studi di Trento), Università degli Studi di Trento (UNITN)-Istituto Nazionale per la Fisica della Materia (INFM)-Caratterizzazione e Sviluppo di Materiali per la Fotonica e l'Optoelecttronica (CSMFO), and Università degli Studi di Modena e Reggio Emilia (UNIMORE)

Subjects
Nonlinear optics, Materials science, Fabrication, Photoluminescence, Optical fiber, Coupled modes theory, Erbium doped glasses, Er3+-doped glass, Physics::Optics, chemistry.chemical_element, 02 engineering and technology, Condensed Matter::Disordered Systems and Neural Networks, 01 natural sciences, law.invention, Inorganic Chemistry, Erbium, silica glass, Optics, law, 0103 physical sciences, optical amplifier, Electrical and Electronic Engineering, Physical and Theoretical Chemistry, Spectroscopy, Micro-resonator, 010302 applied physics, Optical amplifier, [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], optical amplifiers, business.industry, Organic Chemistry, PACS: 42.70.Ce, 42.82.Et, 78.66.Jg, 82.65.F, Integrated optics, 021001 nanoscience & nanotechnology, Laser, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, Condensed Matter::Soft Condensed Matter, Er doped glass, chemistry, microsphere, Bistability, Whispering-gallery wave, 0210 nano-technology, business
Abstract

published in " Optical Materials ", special issue " Selected Papers of the Second International Workshop on Photonic and Electronic Materials ", topic " Photonic materials "; International audience; Er3+ -doped glasses have been a subject of great interest in the recent years for their application in the areas of guided wave optical amplifiers and lasers. Oxide-glass matrices, in particular, offer the advantage of relatively simple fabrication processes--both for bulk glasses and optical fibers--and have demonstrated quite good properties in the 1.5 µm wavelength band. Here we present some results we have obtained in the development of different silica-based glasses and in their application to the production of integrated optical amplifiers and microspherical lasers. As to the former application, two classes of silica glasses have been produced and investigated, namely a melted soda-lime-alumino-silicate glass and a sol-gel silica-hafnia glass. Both of them exhibit a wide emission bandwidth and seem quite promising for broadband optical amplifiers. We also demonstrated low-threshold microlasers, based on whispering gallery mode spherical resonators, fabricated in different oxide glasses.

Published
2005

2. 40 GHz electro-optic modulation in hybrid silicon-organic slotted photonic crystal waveguides

Author

Jan Hendrik Wülbern, Martin Jenett, Alexander Petrov, Jingdong Luo, Stefan Prorok, Manfred Eich, Arne F. Jacob, Alex K.-Y. Jen, and Jan Hampe

Subjects
Materials science, Pockels-Effekt, Photonic bandgap materials (for photonic crystal lasers, see 42.55.Tv) [42.70.Qs], Silicon on insulator, Physics::Optics, 42.79.Hp, Waveguide (optics), 42.82.Et, Elektrooptischer Effekt, Optics, 42.70.Qs, 42.70.Mp, Photonischer Kristall, 78.20.Jq, Waveguides, couplers, and arrays (for fiber waveguides, see 42.81.Qb) [42.82.Et], NLO-Polymere, Photonic crystal, nonlinear optical polymer, Optical processors, correlators, and modulators [42.79.Hp], Silicon photonics, business.industry, Photonic integrated circuit, Microstructured optical fiber, Lichtwellenleiter, Atomic and Molecular Physics, and Optics, silicon-on-insulator, Electrooptical effects [78.20.Jq], Nonlinear optical crystals (see also 77.84.-s Dielectric, piezoelectric, and ferroelectric materials) [42.70.Mp], SOI-Technik, Optoelectronics, ddc:620, business, Optical disc, pockels effect, electrooptic effect, photonic crystal, Slotted waveguide
Abstract

In this Letter we demonstrate broadband electro-optic modulation with frequencies of up to 40 GHz in slotted photonic crystal waveguides based on silicon-on-insulator substrates covered and infiltrated with a nonlinear optical polymer. Two-dimensional photonic crystal waveguides in silicon enable integrated optical devices with an extremely small geometric footprint on the scale of micrometers. The slotted waveguide design optimizes the overlap of the optical and electric fields in the second-order nonlinear optical medium and, hence, the interaction of the optical and electric waves.

Published
2010

3. Numerical simulation of waves in periodic structures

Author

Ehrhardt, Matthias, Han, Houde, and Zheng, Chunxiong

Subjects
85.35.-p, 85.35.Be, band structure, Floquet-Bloch theory, 65M99, high-order finite elements, Schrödinger equation, 35B27, 02.70.Bf, 42.82.Et, 31.15.-p, Dirichlet-to-Neumann maps, 35J05, 35Q60, Dirichletto-Neumann maps, Robin-to-Robin maps, Helmholtz equation, periodic media
Abstract

In this work we present a new numerical technique for solving periodic structure problems. This new approach possesses several advantages. First, it allows for a fast evaluation of the Robin-to-Robin operator for periodic array problems. Secondly, this computational method can also be used for bi-periodic structure problems with local defects. Our strategy is an improvement of the recently developed recursive doubling process by Yuan and Lu. In this paper we consider several problems, such as the exterior elliptic problems with strong coercivity, the time-dependent Schrödinger equation and finally the Helmholtz equation with damping.

Published
2008
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4. An improvement in standard photolithography resolution based on Kirchhoff diffraction studies

Author

Dominique Bosc, Michel Gadonna, Azar Maalouf, Fonctions Optiques pour les Technologies de l'informatiON (FOTON), Université de Rennes (UR)-Institut National des Sciences Appliquées - Rennes (INSA Rennes), Institut National des Sciences Appliquées (INSA)-Institut National des Sciences Appliquées (INSA)-École Nationale Supérieure des Sciences Appliquées et de Technologie (ENSSAT)-Télécom Bretagne-Centre National de la Recherche Scientifique (CNRS), Région Bretagne, Conseil Général Côtes d'Armor, Lannion Trégor Agglomération, Communauté Européenne, Etat., Institut National des Sciences Appliquées - Rennes (INSA Rennes), Institut National des Sciences Appliquées (INSA)-Université de Rennes (UNIV-RENNES)-Institut National des Sciences Appliquées (INSA)-Université de Rennes (UNIV-RENNES)-Centre National de la Recherche Scientifique (CNRS)-Université de Rennes 1 (UR1), and Université de Rennes (UNIV-RENNES)-École Nationale Supérieure des Sciences Appliquées et de Technologie (ENSSAT)-Télécom Bretagne

Subjects
Diffraction, Materials science, Acoustics and Ultrasonics, OCIS: 85.40.Hp, 42.70.Jk, 42.25.Fx, 42.79.Ci, 42.82.Et, 42.60.Da, 42.82.-m, Thin layer, 02 engineering and technology, Photoresist, 010402 general chemistry, 01 natural sciences, law.invention, Optics, law, Limit (mathematics), [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], business.industry, Resolution (electron density), 021001 nanoscience & nanotechnology, Condensed Matter Physics, 0104 chemical sciences, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, [SPI.OPTI]Engineering Sciences [physics]/Optics / Photonic, Photolithography, 0210 nano-technology, business, Realization (systems)
Abstract

Topic: Photonics and Semiconductor Device Physics; International audience; This paper demonstrates the realization of submicrometric patterns by using standard photolithography (365 nm). Significant improvements in standard photolithography resolution can be achieved with specific conditions of a very thin layer of photoresist (0.13 µm). Usually, standard photolithography has a resolution limit of about 1 µm. Firstly, using Kirchhoff diffraction theory we show that with these new conditions the theoretical resolution limit could be 0.4 µm. Secondly, in the experimental part, the realization of 0.8 µm size patterns is demonstrated.

Published
2008

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