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1. Influence of lithography process parameter on DICD and taper of photoresist

Author

高朋朋 Gao Peng-peng, 方 亮 Fang Liang, 蔡晓锐 Cai Xiao-rui, 刘 丹 Liu Dan, 黄 晟 Huang Sheng, 陈启超 Chen Qi-chao, 冯家海 Feng Jia-hai, 陈 昊 Chen Hao, 王百强 Wang Bai-qiang, and 秦 刚 Qin Gang

Subjects
Materials science, business.industry, Signal Processing, Optoelectronics, Lithography process, Photoresist, business, Instrumentation, Electronic, Optical and Magnetic Materials
Published
2019
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