1. Effect of Oxygen Admixture on Excited-State Number Densities of Low-Pressure Argon Plasma Based on Collisional Radiative Model
- Author
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Tsuchiya, Yusuke, Nezu, Atsushi, and AKATSUKA, HIROSHI
- Subjects
collisional-radiative model, low-Pressure Argon Plasma, effect of Oxygen Admixture ,衝突輻射モデル、低気圧Arプラズマ、酸素分子混入効果 - Abstract
衝突輻射モデル(以下,CRモデル)に基づき,プラズマの電子温度・密度を非侵襲的に診断する方法は,原則として可能である.しかし,実際のプロセスプラズマにおいては,プロセスガス混入による励起状態への影響が懸念される.そこで本研究では,プロセスプラズマにしばしば用いられる低気圧Arプラズマについて,酸素分子混入を想定した損失項をArCRモデルに組み込むことで,励起状態数密度に生じる影響を理論計算により考察した., Diagnostic techniques for measuring the state of the plasma are important for accurate control of the process plasma.According to previous studies, "a method of non-invasively diagnosing the temperature and density of electrons from the number density of excited states obtained by emission spectroscopy based on the collision emission (CR) model" is possible in principle.However, in actual process plasma, there is a concern that the mixing of process gas will affect the excited state. Therefore, in this study, we investigated the effect on the number density of excited states by incorporating a loss term assuming oxygen molecule contamination into the ArCR model of low-pressure Ar plasma, which is often used for process plasma.
- Published
- 2021