The GaSb/InAs heterostructure has an uncommon broken type II band alignment, for which the bottom of the conduction band in InAs lies below the top of the GaSb valence band. This broken gap leads to very efficient band-to-band tunneling, with the possibility of high current densities. With the recent focus on developing low-power devices, and in particular tunnel-field-effect transistors (TFETs), there is a renewed interest in staggered and broken-gap heterojunctions as they may enable high on-currents and steep subthreshold swing. 1‐4 For transistor applications, it is also important to efficiently control the electric potential of the channel region, and the gate-all-around geometry made possible by the small diameter of nanowires enables gate modulation near the quantum capacitance limit. 5 It is thus highly relevant to realize broken-gap tunnel devices in nanowires. Recently, we demonstrated GaSb/InAs(Sb) nanowire Esaki diodes with high peak current levels and peak-to-valley current ratio (PVCR). 6 By optimizing the doping profiles of these heterostructures, it is hoped that even better performance can be achieved. Doping control may also be crucial for TFET applications, to enable potential modulation in selected parts of the device, as well as to control the threshold voltage and minimize access resistance. In this letter, we thus investigate the influence of p-doping (Zn) and n-doping (Se) on the performance of GaSb/InAs(Sb) nanowire tunnel diodes and present significantly improved device performance over earlier work. In addition, we explore the effects of various doping profiles on the temperature dependent I–V and the threshold voltage of top gated devices. GaSb/InAs nanowires are grown from Au seed particles deposited on GaAs(111)B substrates in a manner similar to that which has been reported previously. 7 The GaSb/InAs heterojunction is characterized as being almost atomically abrupt, but with an Sb transient (InAs1� xSbx) reaching into the InAs segment and decaying exponentially from x ¼0.3‐0.4 down to 0.03‐0.07 over 5‐13nm. This segment will thus be denoted InAs(Sb) in the following. After growth, the samples are annealed in H2 at 490 � C for 10min to form a narrow constriction (neck) at the heterojunction. 8 This removes the short-circuit between the InAs(Sb) segment and an unintentionally formed InAs(Sb) shell (� 3‐5nm thick) surrounding the GaSb nanowire. Doping of the nanowire heterostructures is performed in-situ by adding controlled amounts of diethylzinc (DEZn) or ditertiarybutylselenium (DTBSe) during the growth. Three different doping profiles were investigated: (A) Zn-doped GaSb and unintentionally doped InAs(Sb), (B) Zn-doped GaSb and Zn-doped InAs(Sb), and (C) Zn-doped GaSb and Se-doped InAs(Sb). For type A, several different Zn doping levels were investigated. The ratios between the doping precursor and group-III precursor flows are labelled Zn/Ga, Zn/In, or Se/In in the text and used as qualitative measure of the doping level. The crystal structure of nanowires from all three types of samples was characterized using transmission electron microscopy. In all cases, the GaSb segment and the first 200‐500nm of the InAs(Sb) segment were pure zincblende, with the remainder containing a few (C) or many (A and B) twins but no wurtzite. Previous studies on InAs nanowires show that the electrical properties are not strongly affected unless inclusions of wurtzite are present. 9