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A hybrid deformable x-ray mirror consisting of a mechanical bender and a bimorph deformable mirror has been developed to realize adaptive optical systems, such as zoom condenser optics, for synchrotron-radiation-based x-ray microscopy. In the developed system, both bending mechanisms comprehensively contribute to the formation of the target mirror shape and can narrow the role of piezoelectric actuators, thereby enabling a more stable operation. In this study, the behavior of the bimorph mirror under the clamped condition was investigated, and the sharing of the deformation amount for each bending mechanism was optimized to minimize the amplitude of the voltage distribution of the bimorph mirror. [ABSTRACT FROM AUTHOR]

PZT (lead zirconate titanate)-glued bimorph deformable mirrors are widely used in hard X-ray regimes; however, they have not yet been used in soft X-ray regimes because they are less compatible for usage under high vacuum. In this study, we developed a glue-free bimorph deformable mirror, in which silver nano-particles were employed to bond PZT actuators to mirror substrates. Under an appropriate bonding condition, the bonding layer was confirmed to be uniform and the mirror's bending characteristics were demonstrated to be sufficiently stable; its gas emission rate was also shown to be acceptable. Piezo responses before and after additional heating at 200 °C showed the thermal stability of its bonding and bending properties. [ABSTRACT FROM AUTHOR]

3 S. G. Alcock, I. Nistea, J. P. Sutter, K. Sawhney, J.-J. Fermé, C. Thellièr, and L. Peverini, J. Synchrotron Radiat. Erratum: "Optimal deformation procedure for hybrid adaptive x-ray mirror based on mechanical and piezo-driven bending system" [Rev. Sci. Instrum. This design was described in a patent by Carre[2] and tested by Alcock I et al. i (2015).[3] In the present work, the resulting bimorph mirror from this design was integrated into a mechanical bender system for study as a hybrid deformable mirror system. [Extracted from the article]

Abstract: A silicon etching process using an ultrafine particle dispersion is proposed. The ultrafine particles contain quaternary ammonium hydroxide groups as ion-exchange groups, giving an alkaline dispersion. In the etching process, the fine particles and impurity ions can be easily separated by filtration or dialysis. Dialysis led to a decrease in the concentration of impurities in the dispersion, which included heavy metal ions and alkali metal ions known to result in a rough etched surface and affect the electronic properties of the semiconductor. Our proposed method is applicable to the surface planarization of silicon single crystals, manufacture of semiconductor devices, and fabrication of MEMS (micro-electro and mechanical systems). In addition, the etching waste can be reused after removal of the impurity ions by dialysis. Thus, the method has low environmental burden. Using the proposed alkaline etching dispersion, cathodic electrochemical etching of a silicon single crystal was demonstrated. The etching characteristics, properties of the etched surface, and effects of particle size were evaluated. The roughness of a 2μm×2μm etched p-Si(001) surface was measured to be 0.1228nm Ra (center line average roughness) by AFM. [Copyright &y& Elsevier]

Abstract: Electrochemical etching enables processing with an atomic-level accuracy, without deteriorating the physical properties of the workpiece; however, contamination of its surface with electrolytes is unavoidable. If it is possible to carry out electrochemical etching without using electrolytes, such a process will be applicable to electronic device manufacturing and precision nanoscale processing of semiconductor materials. In addition, this process does not require the use of chemicals, cleaning after processing or disposal of waste fluid, which results in a low-cost and environmentally friendly process. To develop an electrochemical etching process that does not require the use of electrolytes, we proposed a method in which a functional-group-modified electrode is used as the cathode. A carboxylated graphite electrode was prepared by treating a graphite electrode with sulfuric acid. Electrolysis of ultrapure water was carried out using the obtained electrode as a cathode. The results indicate that the electrolysis current obtained using the modified electrode is approximately six-fold that obtained using an unmodified electrode. Furthermore, we can etch a Cu surface conically in ultrapure water. The current efficiency increases by 70% at maximum, and the minimum current required for electrochemical etching decreases compared with that in the case of using an unmodified electrode. [Copyright &y& Elsevier]