1. New fundamental insights into capacitance modeling of laterally nonuniform MOS devices
- Author
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A.J. Scholten, R. van der Hout, J.C.J. Paasschens, M.B. Willemsen, A.C.T. Aarts, D.B.M. Klaassen, and Center for Analysis, Scientific Computing & Appl.
- Subjects
Engineering ,business.industry ,Doping ,Transistor ,Charge (physics) ,Integrated circuit design ,Hardware_PERFORMANCEANDRELIABILITY ,Condensed Matter::Mesoscopic Systems and Quantum Hall Effect ,Capacitance ,Electronic, Optical and Magnetic Materials ,law.invention ,Terminal (electronics) ,law ,Hardware_GENERAL ,MOSFET ,Electronic engineering ,Hardware_INTEGRATEDCIRCUITS ,Optoelectronics ,Electrical and Electronic Engineering ,business ,Communication channel ,Hardware_LOGICDESIGN - Abstract
In compact transistor modeling for circuit simulation, the capacitances of conventional MOS devices are commonly determined as the derivatives of terminal charges, which in their turn are obtained from the so-called Ward-Dutton charge partitioning scheme. For devices with a laterally nonuniform channel doping profile, however, it is shown in this paper that no terminal charges exist from which the capacitances can be derived. Instead, for such devices, a new model is presented for the capacitances themselves. Furthermore, a method is given to incorporate such a capacitance model into circuit simulators, which are traditionally based on terminal charge models. Comparison with two-dimensional device simulations and a segmentation model shows that for a constant mobility, the new capacitance model provides an accurate description for a MOSFET with a laterally diffused channel doping profile. Through a comparison with high-frequency measurements, the agreement between model and experimental results is discussed.
- Published
- 2006
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